This document describes techniques for remanufacturing biomedical sensors. Used biomedical sensors can be refurbished by replacing some components with new ones while reusing other components from the original sensor. For example, electrodes and backing layers may be reused while adhesive layers and foam layers are replaced with new ones. The remanufacturing process involves cleaning, testing, and refurbishing various components of the original sensor.
This document describes techniques for remanufacturing biomedical sensors. Used biomedical sensors can be refurbished by replacing some components with new ones while reusing other components from the original sensor. For example, electrodes and backing layers may be reused while adhesive layers and foam layers are replaced with new ones. The remanufacturing process involves cleaning, testing, and refurbishing various components of the original sensor.
This document describes techniques for remanufacturing biomedical sensors. Used biomedical sensors can be refurbished by replacing some components with new ones while reusing other components from the original sensor. For example, electrodes and backing layers may be reused while adhesive layers and foam layers are replaced with new ones. The remanufacturing process involves cleaning, testing, and refurbishing various components of the original sensor.
This document describes techniques for remanufacturing biomedical sensors. Used biomedical sensors can be refurbished by replacing some components with new ones while reusing other components from the original sensor. For example, electrodes and backing layers may be reused while adhesive layers and foam layers are replaced with new ones. The remanufacturing process involves cleaning, testing, and refurbishing various components of the original sensor.
( 12) Pa tent Applica tion Publica tion ( 10) Pub. N 0. : US 2013/0079618 A1 Sa ndmore et a l. ( 4 3) Pub. D a te: Ma r. 28, 2013 ( 5 4 ) TECHN IQUE FOR REMAN UFACTURIN GA ( 5 2) US. Cl. BIS SEN SOR USPC . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 600/393; 29/4 0208 ( 5 7) ABSTRACT ( 75 ) Inv entors : D onf lld R s a ndmore L y ons CO ( Us ) ; Rema nuf a ctured BIS s ens ors a nd meth ods f or rema nuf a ctur D a v ld P Bes k o Th ornton CO ( Us ) ing us ed BIS s ens ors a re prov ided. Such a rema nuf a ctured s ens or ma y include certa in components f rom a us ed medica l ( 73) As s ig nee: N ellcor Purita n Bennett L L C, Boulder, s ens or a nd certa in neW components . For ex a mple, a rema nu CO ( U S) f a ctured BIS s ens or ma y include a ba ck ing la y er a nd a t lea s t ? rs t, s econd, a nd th ird electrodes dis pos ed on th e ba ck ing ( 21) APPI' N O; 13/24 5 , 04 0 la y er h a v ing a conductiv e ink . Th e ? rs t, s econd, a nd th ird electrodes a re a da pted to be in electrica l conta ct With a pa tient _ to perf orm BIS mea s urements . A f oa m la y er ma y be dis pos ed ( 22) Flled: s ep 26 2011 on a t lea s t a portion of th e ba ck ing la y er, a nd a n a dh es iv e ma y be a tta ch ed to th e f oa m la y er a nd is con? g ured to s ecure th e Publica tion Cla s s i? ca tion rema nuf a ctured BIS s ens or to th e pa tient. Th e ? rs t electrode, th e s econd electrode, th e th ird electrode, th e ba ck ing la y er, or ( 5 1) Int. Cl. a combina tion th ereof , ma y be neW a nd th e f oa m la y er, th e A61B 5 /04 ( 2006. 01) a dh es iv e, or a combina tion th ereof , ma y be f rom a us ed medi B23P 6/00 ( 2006. 01) ca l s ens or. Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 1 0f 15 US 2013/0079618 A1 mm a ) 21 @ @ Emmi \ Q IOEw , mm g em r ma ; / % \ 21 g m 8 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 2 0f 15 US 2013/0079618 A1 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 3 0f 15 US 2013/0079618 A1 120w r122 OBTN N USED SEN SOR v ( - 124 EN SPECT/TEST USED SEN SOR IS 126 REMAN UFACTURE APPROPRFATE r128 D ISCARD USED SEN SOR r130 REFURBISH SEN SOR ACCORD IN G TO D ESIRED REMAN UFACTURIN G PROCESS v r132 PERFORM SEN SOR TESTlN G v r134 PACK AGE SEN SOR 4 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 4 0f 15 US 2013/0079618 A1 14 0 i r122 OBTAIN USED SEN SOR I , 124 PREPARE USED SEN SOR FOR REMAN UFACTURE PROCESS I , 14 2 EXPOSE AT L EAST A PORTION OF FL EXIBL E EL ECTROD E I , 14 4 REMOVE cow nuonv e GEL FROM EL ECTROD E WEL L AREA I r14 6 REFURBISH AD HESIVE/FOAM L AY ER I { 4 4 8 PL ACE GEL SUPPORT AN D PREP SURFACE OVER EL ECTROD E I { - 15 0 PROVID E CON D UCTIVE GEL I { 15 2 REFURBISH MEMORY I { 15 4 PL ACE SEN SOR ON L IN ER FIG. 5 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 5 0f 15 US 2013/0079618 A1 /162 REMOVE EL ECTROD E WEL L STRUCTURE COVERIN G FL EXIBL E EL ECTROD E T r164 PROVED E N EW AD HESIVE D OT v r166 REMOVE CON D UCTWE GEL FROM GEL SUPPORT AN D PREP SURFACE V r168 PL ACE GEL SUPPORT, PREP SURFACE, AN D N EW AD HESTVE D OT OVER EL ECTROD E 6 new /172 REMOVE GEL SUPPORTAN D PREP SURFACE FROM AD HESIVE D OT COVERTN G FL EXIBL E EL ECTROD E T r166 REMOVE CON D UCTTVE GEL FROM GEL SUPPORT AN D PREP SURFACE V AD HERE CL EAN ED GEL SUPPORTAN D PREP SURFACE TO EXISTL N G AD HESIVE D OT G 7 180w r162 REMOVE EL ECTROD E WEL L STRUCTURE COVERIN G FL EXIBL E EL ECTROD E V r182 PROVTD E N EW EL ECTROD E WEL L STRUCTURE V ( 184 PL ACE N EW EL ECTROD E WEL L STRUCTURE OVER EL ECTROD E F I G 8 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 6 0f 15 US 2013/0079618 A1 190w r172 REMOVE GEL SUPPORT AN D PREP SURFACE FROM AD HESIVE D OT COVERWG FL EXIBL E EL ECTROD E v /- 192 PROVED E GEL SUPPORT AN D PREP SURFACE V AD HERE N EW GEL SUPPORT- AN D PREP SURFACE TO EXESTIN G AD HESIVE D OT 9 r 78, 80, 82 1s , 84 219w , 4 62 REMOVE EL ECTROD E WEL L STRUCTURE COVERIN G FL EXEBL E EL ECTROD E v r212 PROVID E VISOOUS CON D UCTIVE GEL J , /214 OISPOSE VISCOUS CON D UCTIVE GEL WITHIN EL ECTROD E WEL L HQ, 1 ' 1 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 7 0f 15 US 2013/0079618 A1 MBA- N , 220 REMOVE EXISTIN G FOAM AN D AD HESIVE L AY ERS I , 222 PROVID E N EW PATIEN T CON TACTIN G FOAM AN D AD HESIVE L AY ERS I r224 AD HERE N EW FOAM AN D AD HESIVE L AY ER TO SEN SOR SUBSTRATE L AY ER 1 2 /25 0 REMOVE PORTION OF EXISTIN G PATIEN T- CON TACTIN G FOAM AN D AD HESIVE L AY ER I r25 2 PROVID E N EW PATIEN T- CON TACTIN G FOAM AN D AD HESIVE L AY ER I r25 4 AD HERE N EW PATIEN T~ CON TACTIN G FOAM AN D AD HESIVE L AY ER TO REMAIN IN G PORTION OF EXISTIN G PATIEN T- CON TACTIN G FOAM AN D AD HESIVE L AY ER 1 4 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 8 0f 15 US 2013/0079618 A1 14 6C \ r260 REMOVE AD HESIVE L AY ER FROM FOAM L AY ER I I , - 262 PROVID E N EW PATIEN T- CON TACTIN G AD HESIVE L AY ER I r264 AD HERE N EW PATIEN T- CON TACTIN G AD HESIVE L AY ER TO EXISTIN G FOAM L AY ER 1 5 14 6D - N r270 PROVID E N EW AD HESIVE TRAN SFER TAPE I [ 272 AD HERE N EW TRAN SFER TAPE TO EXISTIN G PATIEN T- CON TACTIN G AD HESIVE AN D FOAM L AY ER FIG. 17 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 9 0f 15 12- 282 280 FIG. I8< 62 \ 60 US 2013/0079618 A1 r260 REMOVE AD HESIVE L AY ER FROM FOAM L AY ER I ( - 290 PROVID E PL URAL ITY OF N EW L AMIN ATED PATIEN T- CON TACTIN G AD HESIVE L AY ERS I r292 AD HERE N EW PATIEN T- CON TACTIN G AD HESIVE L AY ERS TO EXISTIN G FOAM L AY ER FIG. 19 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 10 0f 15 US 2013/0079618 A1 300 N , 122 OBTAIN USED SEN SOR I ( 124 PREPARE USED SEN SOR FOR REMAN UFACTURE PROCESS I r14 2 EXPOSE AT L EASTA PORTION OF FL EXIBL E EL ECTROD E I r14 4 REMOVE CON D UCTIVE GEL FROM EL ECTROD E WEL L AREA I { 14 6 REFURBISHAD HESIVEIFOAM L AY ER I { 302 REFURBISH FL EXIBL E CON D UCTIVE EL ECTROD E AN D ! OR CIRCUIT TRACES I r 14 8 PL ACE GEL SUPPORT AN D PREP SURFACE OVER EL ECTROD E I r15 0 PROVID E CON OUCTIVE GEL I { ' 5 2 REFURBISH MEMORY I r15 4 PL ACE SEN SOR ON L IN ER FIG. 20 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 11 0f 15 US 2013/0079618 A1 CL EAN EXPOSED PORTION OF CJ RCUET If RE- ION iZ E EXPOSED CON D UC' FIVE EN K 3028 w [ 310 CL EAN EXPOSED PORTION S OF CIRCUIT i ( 320 PROViD E N EW COMD UCTIEVE iN K l1 r322 D ISPOSE N EW CON D UCTIVE IN K OVER EXPOSED iN K OF CIRCUIT FIG. 23 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 12 0f 15 US 2013/0079618 A1 3020K t [ 310 CL EAN EXPOSED PORTION OF CiRCUET T /330 PROVID E METAL IN K T /332 D ISPOSE METAL IN K OVER EXPOSED PORTION OF CIRCUIT T /334 ION lZ E METAL IN K 15 2k r34 0 REMOVE PAD D L E CON N ECTOR AN D MEMORY UN iT T r34 2 PROVID E N EW PAD D L E CON N ECTOR AN D MEMORY UN IT J r r34 4 ATTACH N EW PAD D L E CON N ECTOR TO SEN SOR FIG. 26 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 13 0f 15 US 2013/0079618 A1 15 2Bw r35 0 PROVID E MEMORY AL TERATION D EVICE V CON N ECT PAD D L E CON N ECTOR/MEMORY UN IT TO MEMORY AL TERATION D EVICE \ r r 35 4 RE- PROGRAMICL EAN MEMORY UN IT I r35 6 REMOVE MEMORY UN IT FROM MEMORY AL TERATION D EVICE FIG. 27 16A 15 20 N , 370 PROVID E AD APTER FOR MEMORY UN IT I , 372 CON N ECT PAD D L E CON N ECTOR/MEMORY UN IT TO AD APTER I r374 RETAIN AD APTER AS PART OF PAD D L E CON N ECTOR FIG. 29 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 14 0f 15 US 2013/0079618 A1 15 20 N /380 PROVID E MEMORY EMUL ATOR AN D N EW MEMORY UN ET l , 382 ATTACH USED MEMORY UN IT TO MEMORY EMUL ATOR l , 384 EMUL ATE CON FTGURATION OF USED MEMORY UN IT ON N EW MEMORY UN IT i /386 REMOVE USED MEMORY UN TT l , 388 ATTACH N EW MEMORY UN IT TO SEN SOR 390w , 122 OBTAIN USED SEN SOR T r34 0 REMOVE PAD D L E CON N ECTOR AN D MEMORY UN IT [ 1 /15 2B, 15 2C REFURBISH PAD D L E CON N ECTOR/MEMORY UN IT T [ 392 PROViD E N EW SEN SOR T r394 ATTACH REFURBISHED CON N ECTOR/MEMORY UN lT TO N EW EEG SEN SOR FIG. 31 Pa tent Applica tion Publica tion Ma r. 28, 2013 Sh eet 15 0f 15 US 2013/0079618 A1 r122 | OBTAIN USED SEN SOR | I r4 22 I STERlL iZ E USED SEN SOR I I r4 24 ] OISASSEMBL E uSEO SEN SOR | I , 4 26 OBTAIN N EW SEN SOR MATERIAL HAVIN G D IFFEREN T CON FIGURATION THAN USED SEN SOR I /4 28 REMAN UFACTURE USED SEN SOR COMPON EN TS TO CON FORM TO CON FIGURATION OF N EW SEN SOR MATERIAL S I r4 30 IN TEGRATE USED SEN SOR COMPON EN TS WITH N EW SEN SOR MATERIAL S I r4 62 I COMPL ETE ASSEMBL Y OF N EW SERSOR | I { 15 4 | PL ACE SEN SOR ON L IN ER I FIG. 33 US 2013/0079618 A1 TECHN IQUE FOR REMAN UFACTURIN G A BIS SEN SOR BACK GROUN D [ 0001] Th e pres ent dis clos ure rela tes g enera lly to rema nu f a ctured medica l dev ices a nd, more pa rticula rly , to rema nu f a cturing s ens ors us ed f or s ens ing ph y s iolog ica l pa ra meters of a pa tient. [ 0002] Th is s ection is intended to introduce th e rea der to v a rious a s pects of a rt th a t ma y be rela ted to v a rious a s pects of th e pres ent dis clos ure, Wh ich a re des cribed a nd/or cla imed beloW. Th is dis cus s ion is believ ed to be h elpf ul in prov iding th e rea der With ba ck g round inf orma tion to f a cilita te a better unders ta nding of th e v a rious a s pects of th e pres ent dis clos ure. According ly , it s h ould be unders tood th a t th es e s ta tements a re to be rea d in th is lig h t, a nd not a s a dmis s ions of prior a rt. [ 0003] In th e ? eld of medicine, doctors of ten des ire to monitor certa in ph y s iolog ica l ch a ra cteris tics of th eir pa tients . According ly , a Wide v a riety of dev ices h a v e been dev eloped f or monitoring certa in ph y s iolog ica l ch a ra cteris tics of a pa tient. Such dev ices prov ide doctors a nd oth er h ea lth ca re pers onnel With th e inf orma tion th ey need to prov ide th e bes t pos s ible h ea lth ca re f or th eir pa tients . As a res ult, s uch moni toring dev ices h a v e become a n indis pens a ble pa rt of modern medicine. [ 0004 ] One tech niq ue f or monitoring certa in ph y s iolog ica l ch a ra cteris tics of a pa tient is commonly ref erred to a s elec troenceph a log ra ph y ( EEG) , a nd th e dev ices built ba s ed upon electroenceph a log ra ph ic tech niq ues a re commonly ref erred to a s EEG monitors . EEG monitors us e non- inv a s iv e electro ph y s iolog ica l monitoring to ev a lua te g loba l ch a ng es in a pa tients condition, f or ex a mple, during s urg ica l procedures . Ex a mples of g loba l ch a ng es ma y include a s s es s ing th e ef f ects of a nes th etics , ev a lua ting a s y mmetric a ctiv ity betWeen th e lef t a nd rig h t h emis ph eres of th e bra in in order to detect cerebra l is ch emia , a nd detecting burs t s uppres s ion. One s uch tech niq ue includes bis pectra l index ( BIS) monitoring to mea s ure th e lev el of cons cious nes s by a lg orith mic a na ly s is of a pa tients EEG during g enera l a nes th es ia . [ 0005 ] EEG mea s urements a re ca ptured us ing EEG moni toring dev ices , a nd s ens ors a s s ocia ted With th es e monitoring dev ices a re a pplied to th e pa tient. Ty pica lly , th e s ens ors include electrodes th a t ma y be a pplied to v a rious a na tomies of th e pa tient ( e. g . , th e temple a nd/or f oreh ea d) . For ex a mple, s ens ors f or BIS monitoring ma y include a s ing le s trip th a t includes s ev era l electrodes f or pla cement on th e f oreh ea d to noninv a s iv ely a cq uire a n EEG s ig na l. Beca us e th e BIS s en s ors a re pla ced in direct conta ct With a pa tient, a nd pos s ibly pa tient ? uids , BIS s ens ors a re ty pica lly intended f or us e With a s ing le pa tient. Th us , BIS s ens ors a re ty pica lly dis ca rded a f ter us e. BRIEF D ESCRIPTION OF THE D RAWIN GS [ 0006] Adv a nta g es of th e dis clos ed tech niq ues ma y become a ppa rent upon rea ding th e f olloWing deta iled des cription a nd upon ref erence to th e dra Wing s in Wh ich : [ 0007] FIG. 1 is a f ront v ieW of a n embodiment of a moni toring s y s tem con? g ured to be us ed With a s ens or f or per f orming BIS mea s urements , in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0008] FIG. 2 is a n ex ploded pers pectiv e v ieW of a n embodiment of th e s ens or of FIG. 1, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; Ma r. 28, 2013 [ 0009] FIG. 3 is a s ch ema tic repres enta tion of a n embodi ment of th e s ens or of FIG. 2 in pa ck a g ed f orm, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0010] FIG. 4 is a proces s How dia g ra m of a n embodiment of a g enera l meth od f or rema nuf a cturing th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0011] FIG. 5 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing th e s ens or of FIGS. 1- 3, including ref urbis h ing th e body of th e s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0012] FIG. 6 is a proces s How dia g ra m of a n embodiment of a meth od f or remov ing a nd repla cing f ea tures dis pos ed With in electrode Wells of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0013] FIG. 7 is a proces s How dia g ra m of a n embodiment of a meth od f or remov ing a nd repla cing f ea tures dis pos ed With in electrode Wells of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0014 ] FIG. 8 is a proces s How dia g ra m of a n embodiment of a meth od f or remov ing a nd repla cing f ea tures dis pos ed With in electrode Wells of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0015 ] FIG. 9 is a proces s How dia g ra m of a n embodiment of a meth od f or remov ing a nd repla cing f ea tures dis pos ed With in electrode Wells of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0016] FIG. 10 is a cros s - s ectiona l v ieW, ta k en a long line 10- 10, of a n embodiment of th e s ens or of FIGS. 1- 3 h a v ing a s elf - s upporting conductiv e g el, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0017] FIG. 11 is a proces s How dia g ra m of a n embodiment of a meth od f or remov ing f ea tures dis pos ed With in electrode Wells of th e s ens or of FIGS. 1- 3 a nd repla cing th e f ea tures With th e s elf - s upporting conductiv e g el of FIG. 10, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0018] FIG. 12 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing a body of th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0019] FIG. 13 is a cros s - s ectiona l v ieW, ta k en a long line 10- 10, of a n embodiment of th e s ens or of FIGS. 1- 3 h a v ing multiple f oa m la y ers , in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0020] FIG. 14 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing a body of th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0021] FIG. 15 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing a body of th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0022] FIG. 16 is a cros s - s ectiona l v ieW, ta k en a long line 10- 10, of a n embodiment of th e s ens or of FIGS. 1- 3 h a v ing a n a dditiona l pa tient- conta cting a dh es iv e dis pos ed ov er a us ed pa tient- conta cting a dh es iv e, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0023] FIG. 17 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing a body of th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0024 ] FIG. 18 is a n ex ploded pers pectiv e v ieW of a n embodiment of th e s ens or of FIGS. 1- 3 a nd illus tra ting a plura lity of pa tient- conta cting la y ers la mina ted ov er a f oa m la y er of th e s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0025 ] FIG. 19 is a proces s How dia g ra m of a n embodiment of a meth od f or rema nuf a cturing a body of th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; US 2013/0079618 A1 [ 0026] FIG. 20 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or rema nuf a cturing th e s ens or of FIGS. 1- 3 including replenis h ing th e conductiv e ink of th e electrodes a nd/ or conductors of th e s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0027] FIG. 21 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or replenis h ing th e conductiv e ink of th e elec trodes a nd/or conductors of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0028] FIG. 22 is a cros s - s ectiona l v ieW, ta k en a long line 10- 10, of a n embodiment of th e s ens or of FIGS. 1- 3 h a v ing a neW conductiv e ink dis pos ed ov er a us ed conductiv e ink , in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0029] FIG. 23 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or replenis h ing th e conductiv e ink of th e elec trodes a nd/or conductors of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0030] FIG. 24 is a s ch ema tic depiction of a n embodiment of a proces s f or ioniZ ing a meta llic ink dis pos ed on th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0031] FIG. 25 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or replenis h ing th e conductiv e ink of th e elec trodes a nd/or conductors of th e s ens or of FIGS. 1- 3, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0032] FIG. 26 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or ref urbis h ing th e memory unit of th e s ens or of FIGS. 1- 3, including repla cing th e connector of th e s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0033] FIG. 27 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or ref urbis h ing th e memory unit of th e s ens or of FIGS. 1- 3, including re- prog ra mming th e memory unit con ta ined With in th e connector of th e s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0034 ] FIG. 28 is a f ront v ieW of a n embodiment of th e s ens or of FIGS. 1- 3 h a v ing a n a da pter coupled to th e connec tor f or a ltering th e opera bility of th e memory unit, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0035 ] FIG. 29 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or ref urbis h ing th e memory unit of th e s ens or of FIGS. 1- 3, including prov iding a n a da ptor f or th e time- out f ea ture conta ined With in th e connector of th e s ens or, in a ccor da nce With a n a s pect of th e pres ent dis clos ure; [ 0036] FIG. 30 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or ref urbis h ing memory unit of th e s ens or of FIGS. 1- 3, including emula ting th e memory unit on a neW memory unit, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0037] FIG. 31 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or rema nuf a cturing th e s ens or of FIGS. 1- 3 including reta ining only th e connector a nd memory unit a nd repla cing th e us ed s ens or With a neW s ens or, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; [ 0038] FIG. 32 is a f ront v ieW of a n embodiment of a s ens or h a v ing neW components a nd rema nuf a ctured components f rom th e s ens or of FIGS. 1- 3, in a ccorda nce With a n a s pect of th e pres ent dis clos ure; a nd [ 0039] FIG. 33 is a proces s ? oW dia g ra m of a n embodiment of a meth od f or rema nuf a cturing th e s ens or of FIGS. 1- 3 to produce th e s ens or of FIG. 32, in a ccorda nce With a n a s pect of th e pres ent dis clos ure. Ma r. 28, 2013 D ETAIL ED D ESCRIPTION OF SPECIFIC EMBOD IMEN TS [ 004 0] One or more s peci? c embodiments of th e pres ent tech niq ues Will be des cribed beloW. In a n ef f ort to prov ide a concis e des cription of th es e embodiments , not a ll f ea tures of a n a ctua l implementa tion a re des cribed in th e s peci? ca tion. It s h ould be a pprecia ted th a t in th e dev elopment of a ny s uch a ctua l implementa tion, a s in a ny eng ineering or des ig n proj ect, numerous implementa tion- s peci? c decis ions mus t be ma de to a ch iev e th e dev elopers s peci? c g oa ls , s uch a s com plia nce With s y s tem- rela ted a nd bus ines s - rela ted cons tra ints , Wh ich ma y v a ry f rom one implementa tion to a noth er. More ov er, it s h ould be a pprecia ted th a t s uch a dev elopment ef f ort mig h t be complex a nd time cons uming , but Would nev erth e les s be a routine underta k ing of des ig n, f a brica tion, a nd ma nuf a cture f or th os e of ordina ry s k ill h a v ing th e bene? t of th is dis clos ure. [ 004 1] Th e pres ent dis clos ure is g enera lly directed to th e rema nuf a cturing of bis pectra l index ( BIS) s ens ors h a v ing one or more electrodes f or monitoring bra in a ctiv ity of a pa tient. For ex a mple, th e s ens ors des cribed h erein ma y include one or more electrodes , s uch a s a t lea s t tWo electrodes , f or ca pturing electrica l da ta f rom a pa tients bra in, a nd f ea tures f or f a cili ta ting th e ca pture a nd tra ns mitta l of th e da ta f rom th e pa tient to a pa tient monitor. Th us , th e BIS s ens ors des cribed h erein ma y be cons tructed us ing a combina tion of neW ma teria ls ( i. e. , ma teria ls th a t h a v e not been incorpora ted into a BIS s ens or) a nd components ta k en f rom one or more us ed BIS s ens ors ( e. g . , a n electrode) . For ex a mple, a BIS s ens or ma y include a ba s e la y er s upporting a ? ex ible a rra y of electrodes con? g ured to ca pture electrica l da ta f rom a pa tient, a conduc tiv e g el to f a cilita te th e tra ns mis s ion of th e electrica l s ig na ls f rom th e pa tient to th e s ens or, one or more f oa m pieces to pa d th e BIS s ens or, a nd a n a dh es iv e la y er f or a tta ch ing th e s ens or to th e pa tient, s uch a s to th e pa tient s f oreh ea d a nd/ or temple. According ly , BIS s ens ors cons tructed us ing th e rema nuf a c turing tech niq ues des cribed h erein ma y incorpora te us ed f oa m la y ers , ? ex ible circuits , a nd, in certa in embodiments , ex is ting but unus ed a dh es iv e la y ers , or a ny combina tion th ereof . [ 004 2] By Wa y of ex a mple, a BISTM s ens or a v a ila ble f rom As pect Medica l Sy s tems , Inc. , s uch a s a BISTM Qua ttro s en s or, a BISTM ex tend s ens or, a BISTM pedia tric s ens or, or a BISTM bila tera l s ens or, Wh ich include a plura lity of printed electrodes on a ? ex ible s ubs tra te, repres ent one ty pe of EEG s ens or. It s h ould be noted, h oWev er, th a t th e pres ent dis clo s ure is a pplica ble to a ny EEG or s imila r s ens or h a v ing s imila r or th e s a me ma teria ls a nd/ or con? g ura tion a s th os e des cribed h erein. Furth er, oth er s ens ors h a v ing s ome or a ll of th e com ponents des cribed h erein ( e. g . , ECG s ens ors , g enera l EEG s ens ors , puls e ox imetry s ens ors , or s ens ors us ed f or mea s ur ing Wa ter f ra ction or h ema tocrit) ma y bene? t f rom th e dis clos ed tech niq ues . Th e BIS s ens ors dis clos ed h erein ma y be us ed in conj unction With a ny s uita ble monitoring s y s tem, Wh ich is des cribed With res pect to FIG. 1. An ex a mple BIS s ens or a nd its components a re dis cus s ed With res pect to FIG. 2, a nd a pa ck a g ed EEG s ens or is dis cus s ed With res pect to FIG. 3. As noted a bov e, th es e s ens ors a re g enera lly k noWn to be one- time- us e s ens ors th a t ma y be dis ca rded a f ter us e by one pa tient. Th oug h dis pos a ble, s ome components of th es e us ed s ens ors , s uch a s th e conductors , connectors , a nd memory units a s s ocia ted th ereWith , ma y be employ ed in th e cons truction of rema nuf a ctured s ens ors . Reus ing th es e com ponents to recons truct a s ens or ma y reduce Wa s te ( e. g . , pla s tic US 2013/0079618 A1 Wa s te ma teria ls ) , cons eq uently reducing a n impa ct on th e env ironment, Wh ile a ccording ly reducing cos ts . Va rious embodiments of rema nuf a cturing tech niq ues a nd th e con ? g ura tions th a t res ult a re dis cus s ed With res pect to FIGS. 4 - 33. [ 004 3] With th e f oreg oing in mind, FIG. 1 is a f ront v ieW of a n embodiment of a pa tient monitoring s y s tem 10. Th e moni toring s y s tem 10 ma y include a s ens or 12 a nd a n EEG monitor 14 . Th e s ens or 12 ma y include electrodes 16 ( e. g . , f our elec trodes 16A, 16B, 16C, a nd 16D ) th a t ma y be s elf a dh erent a nd s elf prepping to temple a nd f oreh ea d a rea s of a pa tient a nd th a t a re us ed to a cq uire EEG s ig na ls . As dis cus s ed in deta il beloW, th e electrodes 16 ma y include a printed conductiv e ink s upported With in a ? ex ible s ens or body 18 to prov ide enh a nced ? ex ibility a nd conf orma nce to pa tient tis s ue. Th e s ens or 12 ma y include a pa ddle connector 20, Wh ich couples th roug h a connector 22 to a ca ble 24 ( e. g . , a pa tient interf a ce ca ble) , Wh ich in turn ma y be coupled to a ca ble 26 ( e. g . , a pig ta il ca ble) . In certa in embodiments , th e s ens or 12 ma y be coupled to th e ca ble 26 th ereby elimina ting th e ca ble 24 . Th e ca ble 26 ma y be coupled to a dig ita l s ig na l conv erter 28, Wh ich in turn is coupled to th e ca ble 30 ( e. g . , a monitor interf a ce ca ble) . In certa in embodiments , th e dig ita l s ig na l conv erter 28 ma y be embedded in th e monitor 14 to elimina te th e ca bles 26 a nd 30. Ca ble 26 ma y be coupled to th e monitor 14 v ia a port 32 ( e. g . , a dig ita l s ig na l conv erter port) . [ 004 4 ] Th e monitor 14 ma y be ca pa ble of ca lcula ting ph y s iolog ica l ch a ra cteris tics rela ting to th e EEG s ig na l receiv ed f rom th e s ens or 12. For ex a mple, th e monitor ma y be ca pa ble of a lg orith mica lly ca lcula ting BIS f rom th e EEG s ig na l. BIS is a mea s ure of a pa tients lev el of cons cious nes s during g enera l a nes th es ia . Furth er, th e monitor 14 ma y include a dis pla y 34 ca pa ble of dis pla y ing ph y s iolog ica l ch a r a cteris tics , h is torica l trends of ph y s iolog ica l ch a ra cteris tics , oth er inf orma tion a bout th e s y s tem ( e. g . , ins tructions f or pla cement of th e s ens or 12 on th e pa tient) , a nd/or a la rm indica tions . Th e monitor 14 ma y dis pla y a pa tients BIS v a lue 36. Th e BIS v a lue 36 repres ents a dimens ionles s number ( e. g . , ra ng ing f rom 0, i. e. , s ilence, to 100, i. e. , f ully a Wa k e a nd a lert) output f rom a multiv a ria te dis crimina te a na ly s is th a t q ua nti? es th e ov era ll bis pectra l properties ( e. g . , f req uency , poWer, a nd ph a s e) of th e EEG s ig na l. For ex a mple, a BIS v a lue 36 betWeen 4 0 a nd 60 ma y indica te a n a ppropria te lev el f or g enera l a nes th es ia . Th e monitor 14 ma y a ls o dis pla y a s ig na l q ua lity index ( SQI) ba r g ra ph 38 ( e. g . , ra ng ing f rom 0 to 100) Wh ich mea s ures th e s ig na l q ua lity of th e EEG ch a nnel s ource( s ) ba s ed on impeda nce da ta , a rtif a cts , a nd oth er v a ri a bles . Th e monitor 14 ma y y et a ls o dis pla y a n electromy o g ra ph ( EMG) ba r g ra ph 4 0 ( e. g . , ra ng ing f rom 30 to 5 5 decibels ) Wh ich indica tes th e poWer ( e. g . , in decibels ) in th e f req uency ra ng e of 70 to 110 HZ . Th e f req uency ra ng e ma y include poWer f rom mus cle a ctiv ity a nd oth er h ig h - f req uency a rtif a cts . Th e monitor 14 ma y f urth er dis pla y a s uppres s ion ra tio ( SR) 4 2 ( e. g . , ra ng ing f rom 0 to 100 percent) , Wh ich repres ents th e percenta g e of epoch s ov er a g iv en time period ( e. g . , th e pa s t 63 s econds ) in Wh ich th e EEG s ig na l is cons id ered s uppres s ed ( i. e. , loW a ctiv ity ) . In certa in embodiments , th e monitor 14 ma y a ls o dis pla y a burs t count f or th e number of EEG burs ts per minute, Wh ere a burs t is de? ned a s a s h ort period of EEG a ctiv ity preceded a nd f olloWed by periods of ina ctiv ity or s uppres s ion. Th e monitor 14 ma y y et f urth er dis pla y th e EEG Wa v ef orm 4 4 . In certa in embodiments , th e EEG Wa v ef orm 4 2 ma y be ? ltered. Th e monitor 14 ma y s till f urth er dis pla y trends 4 6 ov er a certa in time period ( e. g . , one Ma r. 28, 2013 h our) f or EEG, SR, EMG, SQL a nd/or oth er pa ra meters . In certa in embodiments , th e monitor 14 ma y dis pla y s tepWis e ins tructions f or pla cing th e s ens or 12 on th e pa tient. In a ddi tion, th e monitor 14 ma y dis pla y a v eri? ca tion s creen v erif y ing th e proper pla cement of ea ch electrode 16 of th e s ens or 12 on th e pa tient. In certa in embodiments , th e monitor 14 ma y s tore ins tructions on a memory s peci? c to a s peci? c s ens or ty pe or model, Wh ich is dis cus s ed in f urth er deta il beloW. In oth er embodiments , th e s ens or 12 ma y include a memory th a t prov ides th e ins tructions to th e monitor 14 . [ 004 5 ] Additiona lly , th e monitor 14 ma y include v a rious a ctiv a tion mech a nis ms 4 8 ( e. g . , buttons a nd s Witch es ) to f a cilita te ma na g ement a nd opera tion of th e monitor 14 . For ex a mple, th e monitor 14 ma y include f unction k ey s ( e. g . , k ey s With v a ry ing f unctions ) , a poWer s Witch , a dj us tment buttons , a n a la rm s ilence button, a nd s o f orth . It s h ould be noted th a t in oth er embodiments , th e pa ra meters des cribed a bov e a nd th e a ctiv a tion mech a nis ms 4 8 ma y be a rra ng ed on dif f erent pa rts of th e monitor 14 . In oth er Words , th e pa ra meters a nd a ctiv a tion mech a nis ms 4 8 need not be loca ted on a f ront pa nel 5 0 of th e monitor 14 . Indeed, in s ome embodiments , a ctiv a tion mech a nis ms 4 8 a re v irtua l repres enta tions in a dis pla y or a ctua l components dis pos ed on s epa ra te dev ices . In a ddition, th e a ctiv a tion mech a nis ms 4 8 ma y a lloW s electing or input ting of a s peci? c s ens or ty pe or model in order to a cces s ins tructions s tored With in th e memory of th e s ens or 12. [ 004 6] One embodiment of th e v a rious components of th e s ens or 12 is illus tra ted With res pect to FIG. 2, Wh ich ma y g enera lly repres ent th e BISTM Qua ttro s ens or, th e BISTM ex tend s ens or, th e BISTM pedia tric s ens or, or th e BISTM bila t era l s ens or mentioned a bov e. For ex a mple, th e embodiment of th e s ens or 12 illus tra ted in FIG. 2 ma y repres ent a BISTM Qua ttro s ens or, Wh erein electrode 16A is con? g ured to f unc tion a s a s ens ing electrode, electrode 16B is con? g ured to monitor a rtif a cts res ulting f rom mus cula r mov ement, s uch a s ey e tWitch ing , electrode 16C is con? g ured to f unction a s a g rounding electrode, a nd electrode 16D is con? g ured to f unc tion a s a ref erence electrode. It s h ould be noted th a t in certa in embodiments , th e s ens or 12 ma y be ca pa ble of perf orming BIS mea s urements With f eWer th a n f our electrodes 16, or more th a n f our electrodes 16. For ex a mple, in one embodi ment, th e s ens or 12 ma y be ca pa ble of perf orming BIS mea s urements us ing only electrodes 16A, 16C, a nd 16D . In oth er embodiments , s uch a s Wh ere th e s ens or 12 is a BISTM bila tera l s ens or, th e electrodes 16 ma y include a ref erence electrode con? g ured to be pla ced a t th e center of th e pa tient s f oreh ea d, tWo electrodes ea ch con? g ured to be pla ced a bov e a n ey e of th e pa tient to monitor a rtif a cts f rom ey e tWitch ing or mov e ment, one g round electrode, a nd tWo electrodes ea ch con? g ured to be pla ced a g a ins t th e pa tient s temples f or monitoring . [ 004 7] As illus tra ted, th e s ens or 12 includes a ba s e s truc tura l la y er 60, a f oa m la y er 62, a ? rs t a dh es iv e 64 con? g ured to s ecure th e f oa m la y er 62 to th e ba s e s tructura l la y er 60, a nd a pa tient- conta cting a dh es iv e 66 con? g ured to s ecure th e s ens or 12 to a pa tient. Th e ba s e s tructura l la y er 60 ma y be cons tructed f rom a ny ? ex ible poly meric ma teria l s uita ble f or us e in medica l dev ices , s uch a s poly es ter, poly ureth a ne, poly propy lene, poly eth y lene, poly v iny lch loride, a cry lics , nitrile, PVC ? lms , a ceta tes , or s imila r ma teria ls th a t f a cilita te conf orma nce of th e s ens or 12 to th e pa tient. On th e oth er h a nd, th e f oa m la y er 62 ma y be rela tiv ely rig id compa red to th e ba s e s tructura l la y er 60 to prov ide pa dding a nd a dditiona l comf ort to th e pa tient. As a n ex a mple, th e f oa m la y er 62 ma y include a ny f oa m ma teria l s uita ble f or us e in medica l a ppli US 2013/0079618 A1 ca tions , s uch a s poly es ter f oa m, poly eth y lene f oa m, poly ure th a ne f oa m, or th e lik e. Th e ? rs t a dh es iv e 64 a nd th e pa tient conta cting a dh es iv e 66 ma y include pres s ure s ens itiv e a dh es iv es s uch a s a n a cry lic- ba s ed a dh es iv e, a s upported tra ns f er ta pe, a n uns upported tra ns f er ta pe, or a ny combina tion th ereof . In certa in embodiments , th e pa tient- conta cting a dh es iv e 66 ma y include a h y drocolloid or s imila r a dh es iv e f or pa tients With s ens itiv e s k in. It s h ould be noted th a t th e f oa m la y er 62 a nd a dh es iv es 64 , 66 ma y be prov ided a s dis crete la y ers a s illus tra ted, or ma y be prov ided a s a s ing le piece. Th a t is , th e f oa m la y er 62 a nd th e a dh es iv es 64 , 66 ma y be prov ided a s a double- coa ted f oa m la y er. In embodiments Wh ere th e a dh es iv es 64 , 66 a re prov ided a s dis crete la y ers , th e f oa m la y er 62 a nd th e a dh es iv es 64 , 66 ma y a ls o include res pectiv e ta bs 63, 65 , 67 to f a cilita te remov a l of ea ch la y er 62, 64 , 66 during rema nuf a cture. Tog eth er, th e ba s e s tructura l a nd f oa m la y ers 60, 62 a nd a dh es iv es 64 , 66, f orm th e s ens or body 18, Wh ich is th e s tructura l s upport in Wh ich th e f ea tures f or collecting EEG- rela ted da ta f rom th e pa tient a re dis pos ed. [ 004 8] Th e s ens or body 18 ma y be con? g ured to f a cilita te proper pla cement of th e s ens or 12 on a pa tients h ea d. For ex a mple, th e s ens or body 18 ma y include a ? rs t body portion 68 a nd a s econd body portion 70 th a t a re j oined by a th in bridg e 72 of th e ba s e s tructura l la y er 60, a nd a re s epa ra ted by a dis continua tion 74 in th e f oa m la y er 62 a nd a dh es iv es 64 , 66. Beca us e th e ba s e s tructura l la y er 60 ma y be cons tructed f rom a ? ex ible poly meric ma teria l, th e bridg e 72 is a ble to bend With a rela tiv ely h ig h deg ree of f reedom ( e. g . , compa red to th e f oa m la y er 62) . In certa in con? g ura tions , th e electrodes 16B, 16C, a nd 16D , Wh ich a re loca ted on th e ? rs t body portion 68, ma y be pla ced on a pa tients f oreh ea d, Wh ile electrode 16A, Wh ich is loca ted on th e s econd body portion 70, is pla ced on th e pa tients temple. Th eref ore, beca us e th e bridg e 72 ca n ea s ily bend, th e s ens or 12 is a ble to a ccommo da te a v a riety of dis ta nces betWeen th e f oreh ea d a nd temple a rea s ( i. e. , h ea d s iZ es ) by ena bling th e s ens or 12 to a rch , tWis t, or ? ex betWeen th e ? rs t a nd s econd body portions 68, 70. [ 004 9] It s h ould be noted th a t th e illus tra ted pla cement of th e bridg e 72 is only one embodiment, a nd th a t th e bridg e 72 ma y be pla ced betWeen oth er electrodes 16 in oth er con? g u ra tions . For ex a mple, in embodiments Wh ere th e s ens or 12 is a BISTM pedia tric s ens or or s imila r s ens or, th e bridg e 72 ma y be betWeen th e electrode 16B a nd th e electrode 16C ra th er th a n th e illus tra ted pla cement. Furth er, th e s ens or 12 ma y include more th a n one bridg e 72, s uch a s tWo or more bridg es 72 dis pos ed betWeen th e electrodes 16 ( e. g . , in a BISTM bila t era l s ens or) . Furth ermore, a leng th l 1 of th e bridg e 72 ma y be v a ried depending on th e end us e of th e s ens or 12 ( e. g . , pedi a tric, s ma ll, reg ula r, or la rg e s iZ es ) . Alterna tiv ely or a ddition a lly , a s dis cus s ed beloW, th e s ens or 12 ma y not include a bridg e portion a nd ma y include con? g ura tions s imila r to th os e des cribed in US. pa tent a pplica tion Ser. N o. 13/074 , 127 entitled Meth od a nd Sy s tem f or Pos itioning a Sens or, ? led Ma r. 28, 201 1, Wh ich is incorpora ted by ref erence h erein in its entirety f or a ll purpos es . [ 005 0] Th e ba s e s tructura l la y er 60 of th e s ens or 12 a ls o includes a plura lity of electrode portions 76 ea ch h a v ing a pa rticula r s h a pe. Th e s h a pe of th e electrode portions 76 ma y be con? g ured to f a cilita te retention of th e s ens or 12 on th e pa tient, a nd, more s peci? ca lly , to ma inta in pres s ure of th e corres ponding electrode 16 on th e electrode portion 76 a g a ins t th e pa tients f oreh ea d or temple. As illus tra ted, th e electrodes 16 a re g enera lly pos itioned a t th e center of th eir res pectiv e electrode portion 76. Th e s h a pes of th e electrode Ma r. 28, 2013 portions 76 ma y a ls o be re? ected in th e s h a pe of th e f oa m la y er 62 a nd th e a dh es iv es 64 , 66, a nd, more s peci? ca lly , th e portions of th e f oa m la y er 62 a nd th e a dh es iv es 64 , 66 th a t ma y a tta ch to corres ponding electrode portions 76 of th e ba s e s tructura l la y er 60. Th e f oa m la y er 62 a nd th e a dh es iv es 64 , 66 a ls o include res pectiv e h oles 78, 80, 82 corres ponding to th e pos ition of th e electrodes 16 to f a cilita te electrica l conta ct With th e pa tient. [ 005 1] As Will be a pprecia ted, th e electrodes 16 a re con s tructed f rom conductiv e ma teria ls to ena ble th e s ens or 12 to perf orm electrica l mea s urements on th e pa tient. Speci? ca lly , in a ccorda nce With certa in embodiments , th e electrodes 16 a re f ormed f rom ? ex ible conductiv e ma teria ls , s uch a s one or more conductiv e ink s . For ex a mple, th e electrodes 16 ma y be produced by printing ( e. g . , s creen printing or ? ex og ra ph ic printing ) a conductiv e ink on th e ba s e s tructura l la y er 60 a nd a lloWing th e ink to dry a nd/ or cure. In certa in embodiments , th e ink ma y be th erma lly cured. Th e s ens or 12 ma y a ls o include a plura lity of conductors 84 dis pos ed ( e. g . , s creen or ? ex og ra ph ica lly printed) on th e ba s e s tructura l la y er 60 to tra ns mit s ig na ls to a nd f rom ea ch of th e electrodes 16 a nd to enh a nce ? ex ibility of th e s ens or 12. Th e conductors 84 ma y be f ormed f rom th e s a me or a dif f erent conductiv e ink th a n th e electrodes 16. Suita ble conductiv e ink s f or th e electrodes 16 a nd th e conductors 84 ma y include ink s h a v ing one or more conductiv e ma teria ls s uch a s meta ls ( e. g . , copper ( Cu) or s ilv er ( Ag ) ) a nd/or meta l ions ( e. g . , s ilv er ch loride ( Ag Cl) ) , ? ller- impreg na ted poly mers ( e. g . , poly mers mix ed With con ductiv e ? llers s uch a s g ra ph ene, conductiv e na notubes , meta l pa rticles ) , or a ny ink h a v ing a conductiv e ma teria l ca pa ble of prov iding conductiv ity a t lev els s uita ble f or perf orming th e EEG or oth er electrica l mea s urements . As a n ex a mple, th e electrodes 16 a nd/or conductors 84 ma y be f ormed f rom a n ink h a v ing a mix ture of Ag a nd Ag Cl. Indeed, in certa in embodiments , s ilv er a nd s a lts th ereof ( e. g . , Ag /Ag Cl) ma y be des ira ble to us e f or th e electrodes 16 a nd conductors 84 due to its enh a nced s ta bility ( e. g . , compa red to copper a nd copper s a lts ) during certa in medica l procedures , s uch a s de? brilla tion. For ex a mple, th e Ag /Ag Cl ma y ena ble th e s ens or to depola riZ e With in a des ired a mount of time ( e. g . , s econds ra th er th a n minutes ) . Th is depola riZ a tion With in a s h ort a mount of time ma y ena ble th e s ens or 12 to be us ed a s h ort time a f ter th e de? brilla tion or s imila r procedure. HoWev er, in a g enera l s ens e, a ny s uita ble conductiv e ma teria l ma y be us ed f or th e electrodes 16 a nd th e conductors 84 . [ 005 2] Th e conductors 84 , a s noted a bov e, a re g enera lly con? g ured to tra ns mit s ig na ls to a nd/or f rom th e electrodes 16. Th us , th e conductors 84 ma y be con? g ured tra ns mit s ig na ls s uch a s poWer, da ta , a nd th e lik e, collected a t or tra ns mitted to ea ch of th e electrodes 16 to or f rom a ta il portion 86 of th e ba s e s tructura l la y er 60. Th e ta il portion 86 of th e ba s e s tructura l la y er 60 includes a n interf a ce reg ion 88 in Wh ich th e s ens or 12 is con? g ured to couple to a noth er connector or th e monitor 14 to ena ble th e monitor 14 to perf orm BIS mea s urements . Additiona lly , th e ta il portion 86 ma y be a ? a t, ? ex ible protrus ion f rom th e body portion 18 of th e s ens or 12 to ena ble th e s ens or 12 to be Worn by th e pa tient With minima l dis comf ort by reducing th e bulk a nd Weig h t of th e s ens or 12 on th e pa tient. [ 005 3] Th e ta il portion 86 a nd th e pa ddle connector 20 interf a ce With one a noth er a t res pectiv e ov erla pping connec tion reg ions 90, 92. Th is ena bles th e s ens or 12 to ph y s ica lly couple to th e connector 22 or th e monitor 14 of FIG. 1. As a n ex a mple, th e pa ddle connector 20 ma y be con? g ured to