Stamping Strip Layout For Optimal Raw Material Utilization
Stamping Strip Layout For Optimal Raw Material Utilization
Stamping Strip Layout For Optimal Raw Material Utilization
Vol. 19/No. 4
2000
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y
y
A B A
B
A
(B)
A
x
b
+
a
a
B (B)
b
Figure 2 Figure 3
Minkowski Sum of Two Polygons Overlap Detection with Minkowski Sums
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Width A A A
A
Sweepline
(A)
A
Pitch
A (A)
A
A Sweepline
Figure 4
Minkowski Sum for a Parallelogram-Shaped Blank
A
overlaps, the blanks need to be translated relative to
each other. This relative translation causes a similar
A (A)
translation of the Minkowski sum, and when the Width
Pitch
Minkowski sum no longer contains the origin, the
blank overlap is eliminated.
This property leads to the observation that the
distance from the origin to the perimeter of A Sweepline
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p=
( x F yS x S y F )
( yS yF )cos() + ( x F xS )sin() (4)
1 2
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Taking the first derivative and simplifying gives the vertices on the Minkowski sum so that a range of
following: 180 is spanned. These angles are the event points
d for vS and vF.
= (8)
d
( x F xS ) yT ( yS yF ) xT + 2wE (( x F xS )cos() ( yS yF )sin()) Step 3: If wE 0, for each pair vS and vF, calculate
AB
( x F yS xS yF )( xT sin() + yT cos() + 2wE )2 *. If * falls between vS and vF, include an event
point for *.
The behavior of can be considered for two
cases. First, if no additional edge width is added to Step 4: Calculate the convex hull of the vertices on
the strip, wE = 0 and the third term in the numerator the Minkowski sum.
of Eq. (8) vanishes. The rest of the numerator is
invariant to changes in , as is the first term in the Step 5: Find the angles of the edges of the convex
denominator. The second term in the denominator is hull. These angles are the event points for vT.
a function of , but because it is squared, its sign will
always be positive. Thus, the sign of Eq. (8) is invari- Step 6: Add event points at the limits of technologi-
ant with changes in , so utilization will either cally feasible orientations. Delete any event points
monotonically increase, monotonically decrease, or that are technologically infeasible.
remain constant as the sweepline passes along the
edge vSvF. This implies that optima must occur at the Step 7: Calculate strip utilization at each event
rotation constraints, that is, the event points. The point. Select the orientation(s) with the highest uti-
global optimum is then found by simply evaluating lization as the optimal orientation(s).
the utilization at each event point where the
sweepline reaches a vertex on the Minkowski sum Algorithms for the calculation of the Minkowski
and selecting the event point orientation that pro- sum (step 1) and convex hull (step 4) can be found
vides the best utilization. in computational geometry texts, such as
In the second case, where wE is not zero, setting ORourke24 or de Berg et al.27 Technological con-
Eq. (8) to zero and solving for * gives the following: straints on blank orientation, such as due to planar
anisotropy, are dealt with simply in this algorithm.
( x F x S ) f + ( x F x S ) yS yT + xT (2 yS yF yS2 ) + x S yT yF
New event points are added to the problem at the
* = tan 1 (9) limits of technologically acceptable rotations. Any
( yS yF ) f yT ( x F x S ) + xT ( x F x S )( yS yF )
2
Examples
Thus, it may be possible for a local maximal point to Figure 7 shows a T-shaped blank surrounded by
occur at a sweepline angle between vS and vF. In this its associated Minkowski sum. The convex hull of
case where wE is not zero, * must be evaluated for the Minkowski sum is also shown with dotted lines.
each edge of the Minkowski sum. On a particular The sweepline is assumed to start at v4 and travel
edge, if * falls between vS and vF, a new event point CCW until it reaches v10, for a total range of rotation
is created at * and its utilization evaluated. of 180. This process is shown for each event point
The optimization algorithm is then constructed as in Figure 8, read right to left, top to bottom. Each
follows: drawing in Figure 8 shows the sweepline at an event
point, either for shifts in vS and vF vertices or for
Step 1: Calculate the Minkowski sum A (A) of shifts in vT vertices. The angle of each event point
the polygonal blank A. was calculated, along with the relevant pitch [Eq.
(4)], strip width [Eq. (5)], and utilization [Eq. (7)],
Step 2: Find the angles between the origin and the and summarized in Table 1. (No technological con-
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(6, 8) (6, 8)
v8 (4, 8) v7
(0, 6) (2, 6)
(4, 6) (6, 6)
(10, 2) (10, 2)
v10 v5
(6, 2) v9 v6 (6, 2)
(0, 0) (2, 0)
(6, 2) v12 v3 (6, 2)
v11 v4
(10, 2) (10, 2)
v1 v2
(6, 8) (6, 8)
Figure 7
Example Blank (Heavy Line), Its Minkowski Sum (Solid Line),
and the Convex Hull (Dotted Line)
Table 1
Event Points for T-Shaped Blank Example
Event Angle
Point () Event Pitch Width Utilization
1 -11.31 vS 4, vF 5, 10.198 9.022 34.8%
vT 7
2 0.00 vT 8 10 8 40.0%
3 11.31 vS 5, vF 6 10.198 9.022 34.8%
4 18.43 vS 6, vF 7 6.324 9.486 53.3%
5 53.13 vS 7, vF 8 10 9.600 33.3%
6 56.31 vT 10 9.614 9.430 35.3%
7 90.00 vT 11 8 10 40.0%
8 123.69 vT 1 9.614 9.430 35.3%
9 126.87 vS 8, vF 9 10 9.600 33.3%
10 161.56 vS 9, vF 10 6.324 9.486 53.3%
11 168.69 vS 10, vF 11 10.198 9.022 34.8%
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55.0%
50.0%
Material utilization (percent)
45.0%
40.0%
35.0%
30.0%
20 30 80 130 180
Sweepline angle (degrees)
Figure 9 Figure 10
Material Utilization as a Function of Sweepline Angle A More Complex Part in Its Optimal Orientation
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To solve for the intersection, use Cramers rule, as Using the identities 1 + tan2() = 1/cos() and
follows: tan() = sin()/cos(),
C B C
p=
0 1 C Acos() + Bsin()
x INT = =
A B A Btan() (A3)
=
( yS y F ) x S + ( x F x S ) yS
tan() 1 ( yS yF )cos() + ( x F xS )sin()
(A6)
x F yS x S y F
=
A C ( yS yF )cos() + ( x F xS )sin()
tan() 0 Ctan()
yINT = =
A B A Btan() (A4)
tan() 1
Authors Biography
Tim J. Nye is an assistant professor in the Mechanical Engineering
Dept. at McMaster University (Hamilton, Ontario, Canada). Dr. Nye
Strip pitch, p, is as follows: received his BASc in mechanical engineering from the University of
Waterloo, his MSc in industrial and systems engineering from Ohio State
University, and his PhD in operations research from the Management
p = x INT
2
+ yINT
2
(= Ov )
INT
Sciences Dept. at the University of Waterloo. His research interests
include the application of optimization techniques to manufacturing oper-
C (A5) ations, development of solid freeform fabrication processes for forging
= 1 + tan 2 ()
A + Btan()
and casting, design of manufacturing systems, and examining stochastic,
queuing-based lot-sizing models. Dr. Nye is currently a member of SME,
NAMRI/SME, ASME, INFORMS, CORS, and PEO.
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