CH06 Floorplan, On Chip (2018) S
CH06 Floorplan, On Chip (2018) S
CH06 Floorplan, On Chip (2018) S
2019
2019//01/08 Shen-
Shen-Li Chen (NUU) 1
OUTLINE
2
I. Floor Planning
(全晶片規劃)
4
General Layout Considerations
5 factors :
NMOS, PMOS, wire, VDD, temperature
4 factors :
NMOS, PMOS, VDD, temperature
3 factors :
NMOS, PMOS, environment
2 factors :
NMOS, PMOS
6
Floor Planning in an IC (IC全晶片規劃)
Floorplanning
Creating a sketch of the layout (佈局整體圖)
A good floorplan includes
An outline of the die (晶粒略圖),
Placements of all pads (銲墊擺置), and
sizes and locations of all major cells (所有
The
設計單元位置及大小)
8
Block Floor Plan (全晶片方塊規劃)
10
電源線佈線 時脈佈線
VDD
VSS
11
(規劃前) (規劃後)
12
Floorplan Example
blocks
13
14
佈局:對稱擺置 電性對稱
Symmetrical arrangement used to obtain electric symmetry
15
16
Case1: Bandgap Circuit (Layout)
17
(類比電路佈局考量)
18
Mixed-Signal Layout Strategy: Layout Procedure
(連導線議題)
(遮蔽議題)
(匹配議題)
(電源接地議題)
(全晶片規劃)
19
Ex: 類比電路
21
(敏感性類比單元)
(中擺幅類比單元)
(高擺幅類比單元)
(低速數位單元)
(高速數位單元)
(數位輸出驅動單元)
22
The worst interference source : digital O/P
The most sensitive interference sensor : analog I/P
Low-speed ones are placed closer to the analog section
(中振幅 類比單元)
(高振幅 類比單元)
(低速數位單元)
(高速數位單元)
(數位輸出驅動單元)
23
24
1). Power/Ground Supply (電源接地議題)
(c) Best:
Using separate power
and ground pins to
achieve even better
noise immunity
25
d (Id Ia )
V L R1 ( I d I a ) R2 I a
dt
26
Adding more power supply pins to distribute the current
In the same manner, if it is physically impossible to
increase the pin count for all bonding pads.
VDD or VSS double bonding
27
28
Matching (匹配議題)
29
(dummy) (dummy)
30
Ex.2: 電阻的佈局
R R
1 2
Dummy strip
Dummy strip
R R
1 2
31
High-value resistor
Made by well diffusion
Adding substrate bias guard ring to prevent noise
injection from substrate
32
Thermal Gradient Effect
Bad Good
33
34
Solutions: (1) Realizing larger capacitors from a parallel
combination of smaller, unit-sized capacitors.
(2) Common-centroid layout .
(3) To minimize errors in capacitor rations due to
overetching, their perimeter-to-area ratios
should be kept the same.
p1 p
2 k
A1 A2
35
36
Adding Dummy Elements
Dummy
Elements
37
38
38
(4). Ex.: MOSFET Device Matching
case1 case2
Differential
input stage
Case 3 (Best)
39
Transistor Layouts
40
(a) Multiple-gate Fingers Type (多指狀)
41
Gate (M2)
Gate (M1)
Drain (M2) 42
(c) Interdigitalized Fingers Type
Source(M3)
Gate(M3,M4)
Gate(M1)
Gate(M2)
Ground
43
G1
G2
VSS
44
3). Block Shielding
(遮蔽議題)
45
46
Shielding: Use a M1 Shielding Layer
Shielding a sensitive analog signal from a digital signal
47
48
Shield all sensitive circuits, devices, and interconnection
lines.
(類比連接線)
(遮蔽用接地線)
(數位連接線)
49
50
Guard Rings (保護環)
51
52
Guard Ring of Internal Circuits
CORE
nMOS nMOS
(數位保護環) (類比保護環)
54
Power distribution of mixed-mode ICs
(保護環)
55
56
過電壓的故障 (§4.8.6 )
MOSFET電晶體很容易被外部的突波(靜電放電)所
損害,例如:氧化層崩潰、接面擊穿、與時間相關
之閘氧化層崩潰,都會形成過電壓(overvoltage)可
靠度的問題。
當過電壓作用於閘極時,就會引發薄氧化層的崩潰
(breakdown)與電弧擊穿(arcing),而摧毀元件。把
高於正常值的電壓作用在源極與汲極之間,而使源
極/汲極空乏區互相接觸,就會造成接面擊穿
(punchthrough)。
降低電源供應的電壓值、減少電源供應的雜訊、在
I/O 銲墊上使用較厚的氧化層,均可改善可靠度。
57
58
Why Need ESD Protection Circuits ?
(為什麼 I/O 需要 ESD 防護電路?)
59
I/O cells
I/O cells
I/O cells
Core
Circuits
I/O cells
60
IC Pad Frame --- ESD Protection Circuits
61
62
Whole Chip ESD Protections (全晶片ESD防護)
ESD2
ESD4
ESD1 ESD3
GND
63
64
Co-related Factors of ESD Immunity
ESD Latch-up
突波 閂鎖
Noise
雜訊
65
Electrical Thermal
電性 熱
ESD
Spatial
空間傳導
性 66
ESD Protection Circuits Response
(ESD 防護電路的反應)
By pass
ESD
current 67
When normal
signal is applied
When ESD
stress is applied
68
ESD Protection Circuits Response
(ESD 防護電路的反應)
69
70
ESD Protection Circuits Should be
(ESD 防護電路應具備之條件)
(respond in 200ps)
71