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All content following this page was uploaded by Vidit Pandey on 19 May 2020.
Thin films :
Its Synthesis and applications
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Deposition Methods
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What is a thin film ?
Being a part of nanotechnology a thin film is a layer of
material ranging from fractions of a nanometer
(monolayer) to several micrometer in thickness.
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How Thick it is ?
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History of thin films
▪ 1850: Development of first deposition techniques (M.Faraday; W.Grove; T.A.Edison) and of methods
of thickness determination (Arago, Fizeau; Wernicke; Wiener)Commercial introduction of
electrochemistry (Galvanics) for gold plating of uniform- accessories
▪ 1931: First TEM was demonstrated by Max Knoll and Ernst Ruska
▪ 1940: vacuum and thin film (PVD) techniques , Industrial manufacturing of coatings mostly for
military.
▪ 2006: Investigation of organic coatings leads to the emergence of organic electronics (OLED,
printable circuits).
▪ 2010: Preparation and characterization of the prototype two dimensional (2d) material, Graphene.
Introduction of reliable solid state touch screens to communication media (Smartphone).
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Deposition methods classification
Surface Coating Method
Chemical Solution
CVD Laser
Deposition
Electrochemical
PVD Thermal Spraying
Deposition
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Here we talk about
CHEMICAL VAPOR DEPOSITION
CVD is the process of chemically reacting a volatile compound of a material to
be deposited, with other gases, to produce a non volatile solid that deposits
atomically on a suitable placed substrate.
▪ Light CVD
▪ Plasma CVD
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Process of CVD
1) Diffusion of 5) Diffusion of
precursors by product
2) Adsorption on 4) Desorption of
Boundary layer the surface adsorbed material
Interface
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CVD – Chemical Vapor Deposition
Pros Cons
High Wear Resistance. Safety : Reactant or product gases are typically
toxic, flammable.
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Physical Vapor Deposition
PVD is characterized by a
process in which the
material goes from a
condensed phase to a vapor
phase and then back to a
thin film condensed phase.
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Evaporation
Substrate
Vacuum Chamber
Source
Boat
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Sputtering
Ar+ Ar +
e- e-
Target
Cathode
S N S
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PVD – Physical Vapor Deposition
Pros Cons
Great Variety of coating can be produced. In order to achieve a uniform coating thickness,
the parts to be coated must be rotated during
processing.
Deposition rates are 10–100Å (1–10 Low deposition rate of sputtering (1 – 10 Å /Sec)
nanometers) per second in evaporation. for Dielectrics.
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Category Application
Electrical Insulation
High conductivity
Semiconductor devices
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▪ Transparent electronics
▪ Developing molecules out of
organic compounds like
carbon and hydrogen
▪ Super-thin film about 100
nanometers thick, can be
Future of applied as a paint.
Thin Films ▪ Flexible, organic and
biodegradable electronics
▪ Super Hydrophobic coating
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References
▪ Thin Film Nanotechnology | TORR INTERNATIONALSERVICES LLC.
(2020). Retrieved, from http://www.torr.com/thin-film-nanotechnology
▪ Sputter: Basic Function - Nanofabrication: Vacuum Pumps and Thin Film
Vacuum Deposition | Coursera. (2020). Retrieved, from
https://www.coursera.org/lecture/nanotechnology/sputter-basic-function-
9IgNe
▪ Thermal Evaporation: Basic Function - Nanofabrication: Vacuum Pumps
and Thin Film Vacuum Deposition | Coursera. (2020). Retrieved , from
https://www.coursera.org/lecture/nanotechnology/thermal-evaporation-
basic-function-6mjsf
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Acknowledgement
The satisfaction that accompanies the successful completion of any task would be incomplete without
the mention of people whose ceaseless cooperation made it possible, whose constant guidance and
encouragement crown all efforts with success.
I am very grateful to Mr. Vidit Pandey (Research Scholar, AMU, Aligarh) for the guidance,
inspiration and constructive suggestions that helps me in the preparation of this presentation.
Physics
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Thank You
Any Questions ?
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