Bai 2018
Bai 2018
a r t i c l e i n f o a b s t r a c t
Article history: Autofocusing and autotracking are widely used in maskless laser lithography, optical imaging, and
Received 30 January 2018 recording and readout of optical information storage. With the development of optoelectronic tech-
Received in revised form 15 March 2018 niques, the accuracy of autofocusing and autotracking thus needs to be improved to the nanoscale,
Accepted 3 April 2018
and the autotracking range also needs to be extended to tens of micrometers. In this work, an astigmatic
method with two cylindrical lenses is proposed, where the focusing error signal is extracted to detect the
focusing error. A theoretical analysis and simulation are carried out, accordingly. A focusing error detec-
tion system is established to demonstrate the theoretical analysis. The experimental results indicate that
the focusing error signal curves present good ‘‘S” characteristics. The linear tracking range is up to 18 lm,
and the tracking accuracy is approximately 50 nm. The theoretical and experimental results indicate that
the astigmatic method with two cylindrical lenses is a good method for autofocusing and autotracking
with both high accuracy and large dynamic range. This work is useful in the fields of high-resolution
maskless laser lithography and optical imaging.
Ó 2018 Elsevier Ltd. All rights reserved.
https://doi.org/10.1016/j.optlastec.2018.04.005
0030-3992/Ó 2018 Elsevier Ltd. All rights reserved.
146 Z. Bai, J. Wei / Optics and Laser Technology 106 (2018) 145–151
Fig. 3. Simplified optical path for the calculation of (a) r x and (b) r y .
3. Calculated and simulated results systems, the defocus amount Da0 is approximately tens of microm-
eters; here, the dynamic linear range can be set as 10 lm <
For an autofocus and autotracking optical system, the parame- L < 40 lm. One can set the initial values as lx ¼ lx0 ¼ 350 mm;
ters lx , lxy , and mx need to be determined using Eqs. (4), (8), and lxy ¼ lxy0 ¼ 20 mm; and mx ¼ mx0 ¼ 140 mm.
(10) when the values of Lo , CLx and CLy are fixed. The parameters In order to obtain a threadlike elliptical spot that also presents
are set as follows f o ¼ 2 mm and ro ¼ 5 mm for Lo ; f x ¼ 80 mm symmetrical change on the FQD, Rx and Ry should be chosen appro-
for CLx ; f y ¼ 150 mm for CLy . The sample is initially placed on the priately. On one hand, the FQD cannot receive all the light if Rx and
focal plane of Lo , thus ao ¼ f o ¼ 2 mm. One can optimize the Ry are too large; on the other hand, the change of the spot is insuf-
parameters lx , lxy , and mx by calculating the dependence of FES ficient to result in a large change in the FQD if Rx and Ry are too
on Da0 , i.e., from ‘‘S” curve with large dynamic tracking range small. That is, improper Rx and Ry values cannot obtain a good
and high tracking accuracy. For the ‘‘S” curve, there is a linear range ‘‘S” curve. Therefore, Rx and Ry should be restricted to an appropri-
between peak point and valley point. For example, Fig. 4 shows a ate range to meet the experimental requirements. Simultaneously,
typical ‘‘S” curve, where the peak point and valley point are marked to decrease the noise from stray lights, it is required that Rx Ry .
as A and B, respectively. The linear response of FES on the defocus According to the requirements, one can set 3:3 mm < Rx <
amount can be set between points C 1 and C 2 . The defocus amount L 3:8 mm, 3:3 mm < Ry < 3:8 mm, and jRx Ry j < 0:1 mm. Then,
shown in Fig. 4 is thus defined as a linear range. the other parameters, lx , lxy , and mx , can be optimized using the
Before optimizing the parameters, one needs to set the initial flow diagram shown in Fig. 5.
values of lx , lxy , and mx according to the experimental requirements. By parameter optimization, lx ¼ 400 mm;mx ¼ 150 mm; and lxy
For example, in maskless laser lithography and optical imaging ¼ 30 mm are obtained, and the ‘‘S” curve thus obtained is pre-
sented in Fig. 6a; the typical spots on the FQD are also given in
Fig. 6b-d. Fig. 6b-d correspond to the sample placed on the apofo-
cal, focal, and perifocal planes, respectively. One can see from Fig. 6
that the linear range L of the ‘‘S” curve is approximately 18 lm, and
the spots on the FQD are threadlike ellipses when the sample is
placed on the apofocal and perifocal planes, respectively.
rx ¼ 3:427 mm;r y ¼ 0:023 mm for the perifocal plane and
rx ¼ 0:023 mm;r y ¼ 3:427 mm for the apofocal plane. The spot on
the FQD becomes circular with r x ¼ 1:727 mm and ry ¼
1:728 mm when the sample is placed on the focal plane.
Fig. 6. Calculated ‘‘S” curve and spot on the FQD. (a) ‘‘S‘‘ curve. Spot shape for the sample placed onto (b) apofocal plane, (c) focal plane, and (d) perifocal plane.
nm passes through the 1/2 waveplate, polarized beam splitter The experimental results of the real spot shape on the FQD are
(PBS), 1/4 waveplate, and an objective lens Lo in succession. It is presented in Fig. 8. The spot is basically circular when one places
then focused onto the sample surface. The beam reflected from the sample on the focal plane, as shown in Fig. 8c. Compared with
the sample surface passes through the objective lens Lo and PBS, original spot of laser beam (as shown in Fig. 8a), the spot size
goes through the DCLG, and focuses on the FQD. The objective lens becomes smaller due to the converging effect of cylindrical lens,
is installed on a piezoelectric tube (PZT) and can be moved up and however, the spot shape is similar to the original shape of laser
down along the z-directional optical axis by feeding the FES into beam. The spot shape changes from an upright ellipse (Fig. 8b),
the PZT controller. Based on the theoretical calculations, the to a circle (Fig. 8c), and to a horizontal ellipse (Fig. 8d) when one
parameters are chosen as follows: f o ¼ 2 mm and ro ¼ 5 mm for moves the sample from the apofocal plane, to the focal plane,
Lo ; f x ¼ 80 mm for CLx ; f y ¼ 150 mm for CLy ; and to the perifocal plane, respectively. By comparing Figs. 6 and
lx ¼ 400 mm;mx ¼ 150 mm;lxy ¼ 30 mm. 8, one can see that the experimental spots are approximately equal
Z. Bai, J. Wei / Optics and Laser Technology 106 (2018) 145–151 149
between the quadrants of the FQD restrict the FES value from
reaching one. The linear range is up to 18 lm as seen in Fig. 9,
and it is consistent with the theoretical value.
Another experiment is carried out to test the accuracy of our
results. In this experiment, if one lets the PZT move up and down
with a frequency of 5 Hz, the FES can be detected. The defocus
amount Da0 can be seen and analyzed through the FES signal.
Fig. 10 shows the experimental results. In Fig. 10a, a square wave
stimulation electric signal is sent into the PZT, and the PZT moves
up and down within a distance of 500 nm, with a frequency of 5
Hz. That is, the Da0 is periodically changed in the up and down
directions, with an amplitude and frequency of 500 nm and 5 Hz,
respectively. The movement of PZT causes the defocus of the sam-
ple and the defocus is measured by using the established setup in
Fig. 7. Experimental schematics of focusing error detection system. (1/2WP-1/2
Fig. 7. Fig. 10b gives the corresponding detection results. It is obvi-
wave plate, 1/4WP-1/4 wave plate, PBS-polarized beam splitter).
ous that the FES curve presents a clear change at a frequency of 5
Hz implying that the focusing error detection system could detect a
to the calculated results. A slight discrepancy between the real and 500 nm defocus amount clearly and precisely. One can continue to
calculated spots may be due to the parameters of the objective lens decrease the defocus amount to 50 nm, as shown in Fig. 10c, where
Lo . In the calculations, Lo is considered as an ideal lens composed of a square wave stimulation electric signal is sent into the PZT which
a single piece of the lens. However, in our experiment, Lo is an moves up and down within a distance of 50 nm with a frequency of
objective lens of high NA. The NA of Lo is 0.90. Lo is actually com- 5 Hz. Fig. 10d shows the detection results; although the curve is
posed of a battery of lenses. Hence, there is no focal length, but not smooth, the time response of FES still changes periodically
only working distance. Thus, in our calculation of the FES and spot, with time.
the working distance is used to replace the focal length of Lo . The noise of the FES value is also measured when the PZT actu-
By observing the change of spot shape on the FQD with the ator is motionless and static. Fig. 11 gives the results. One can see
defocus amount Da0 , the FES curve is obtained, as shown in that the FES noise is in the range of ±0.002, and without any peri-
Fig. 9. In Fig. 9a, the dependence of intensity signal of each quad- odic characteristic. This can tell us that the periodical signal in
rant of the FQD on Da0 is presented; one can see that signal values Fig. 10 is from PZT actuator, not from the noise. The focusing error
in quadrants A and C are the same, and those in quadrants B and D detection method could detect a defocus amount of 50 nm, and the
are the same, which indicates that the shape change of the spot on detection accuracy can reach up to 50 nm.
the FQD with Da0 is symmetrical and uniform. The spot is at the
center of the FQD. Further, the ‘‘S” curve (the dependence of FES 5. Conclusion
on Da0 ) is obtained through the combination of Eq. (1) and
Fig. 9a. Fig. 9b is based on the experimental results and presents In this work, an astigmatic method with two cylindrical lenses
a good ‘‘S” curve characteristic. The FES value changes from is proposed. The theoretical analysis and simulation, to obtain
0.845 to 0.752. The diaphragm in the system and the gap the optimal system parameters, have been provided. The focusing
Fig. 8. The original shape of the laser beam (a) and experimental spot on the FQD. The sample is placed on (b) apofocal plane, (c) focal plane, and (d) perifocal plane of the
objective lens.
Fig. 9. Experiment results of ‘‘S” curves. (a) Dependence of signal in every quadrant on defocus amount, (b) ‘‘S” curve.
150 Z. Bai, J. Wei / Optics and Laser Technology 106 (2018) 145–151
Fig. 10. Accuracy detection of defocus amount Da0 by moving the PZT up and down at a frequency of 5 Hz. (a) For a defocus amount Da0 of 500 nm, (b) the corresponding FES
detection; (c) for a defocus amount Da0 of 50 nm, (d) the corresponding FES detection.
References
[1] T. Wei, J. Wei, K. Zhang, L. Zhang, Image lithography in telluride suboxide thin
film through controlling ‘‘virtual” bandgap, Photonic. Res. 5 (1) (2017) 22–26.
[2] J.C. Cheng, D.Y.C. Choi, Three-step lithography to the fabrication of vertically
coupled micro-ring resonators in amorphous silicon-on-insulator-
corrigendum, Chin. Opt. Lett. 14 (4) (2016) 043501.
[3] Y.H. Zhang, Z.H. Zhang, C. Geng, S. Xu, T.B. Wei, W.G. Bi, Versatile nanosphere
lithography technique combining multiple-exposure nanosphere lens
lithography and nanosphere template lithography, Chin. Opt. Lett. 15 (6)
(2017) 062201.
[4] D. Huerta-Murillo et al., Fabrication of multi-scale periodic surface structures
on Ti-6Al-4V by direct laser writing and direct laser interference patterning for
Fig. 11. The FES noise change with time (the PZT actuator keeps static and modified wettability applications, Opt. Lasers Eng. 98 (2017) 134–142.
motionless). [5] Y. Chen, J. Qin, J.F. Chen, L. Zhang, C.F. Ma, J.R. Chu, X.F. Xu, L. Wang, 16 nm-
resolution lithography using ultra-small-gap bowtie apertures,
error detection system has been established to demonstrate the Nanotechnology 28 (5) (2017) 055302.
[6] N.N. Luo, Z.M. Zhang, Fabrication of a curved microlens array using double
theoretical analysis. The experimental results indicate that the
gray-scale digital maskless lithography, J. Micromechanics Microengineering
obtained FES curve presents a good ‘‘S” characteristic. The linear 27 (3) (2017) 035015.
tracking range and tracking accuracy are found to be nearly 18 [7] M. Deubel, G. Von Freymann, M. Wegener, S. Pereira, K. Busch, C.M. Soukoulis,
lm and approximately 50 nm, respectively. The theoretical and Direct laser writing of three-dimensional photonic-crystal templates for
telecommunications, Nat. Mater. 3 (7) (2004) 444–447.
experimental results indicate that the astigmatic method with [8] M.D. Kong, C. Guo, B.C. Li, W.Y. He, M. Wei, Fabrication of multi-wavelength
two cylindrical lenses provides a good way to autofocusing and visible and infrared filter for solar atmosphere tomographic imaging, Chin. Opt.
autotracking, while maintaining high accuracy and large dynamic Lett. 15 (12) (2017) 123101.
[9] R. Wang, J.S. Wei, Y.T. Fan, Chalcogenide phase-change thin films used as
range simultaneously. The proposed method can be widely applied grayscale photolithography materials, Opt. Express 22 (5) (2014) 4973–4984.
in high-resolution maskless laser lithography system and the con- [10] D.Y. Xia, Z.Y. Ku, S.C. Lee, S.R.J. Brueck, Nanostructures and functional materials
focal optical microscopy. fabricated by interferometric lithography, Adv. Mater. 23 (2) (2011) 147–179.
[11] H.G. Rhee, D.I. Kim, Y.W. Lee, Realization and performance evaluation of high
speed autofocusing for direct laser lithography, Rev. Sci. Instrum. 80 (7) (2009)
073103.
Acknowledgment [12] J. Wei, K. Zhang, T. Wei, Y. Wang, Y. Wu, M. Xiao, High-speed maskless
nanolithography with visible light based on photothermal localization, Sci.
National Natural Science Foundation of China (Nos. 51672292 Rep. 7 (2017) 43892.
[13] Z. Bai, J. Wei, X. Liang, K. Zhang, T. Wei, R. Wang, High-speed laser writing of
and 61627826). International Science & Technology arbitrary patterns in polar coordinate system, Rev. Sci. Instrum. 87 (12) (2016)
Cooperation Program of China: intergovernmental international 125118.
Z. Bai, J. Wei / Optics and Laser Technology 106 (2018) 145–151 151
[14] I. Stoica, A.I. Barzic, C. Hulubei, Fabrication of nanochannels on polyimide films [20] B. Hnilicka, A. Besançon-Voda, H.-J. Schroder, G. Filardi, Modelling the focus
using dynamic plowing lithography, Appl. Surf. Sci. 426 (2017) 307–314. error characteristic of a DVD player, in: Control Applications, Proceedings of
[15] D.E. Denk, A.G. Poleshchuk, Methods of improving the accuracy of operation of the 2002 International Conference on IEEE, vol. 2, 2002, pp. 629–630.
an autofocus in a circular laser writing system, Optoelectronics, Instrum. Data [21] C.-H. Liu, Z.-H. Li, Application of the astigmatic method to the thickness
Process. 46 (1) (2010) 87–95. measurement of glass substrates, Appl. Opt. 47 (21) (2008) 3968–3972.
[16] Y.C. Lee, S. Chao, C.C. Huang, C.T. Yang, Design of a dual-wavelength optical [22] A. Nikolov, D. Wasan, Oil lenses on the air-water surface and the validity of
head for submicron-scale and nanoscale lithography, IEEE Trans. Magn. 47 (3) Neumann’s rule, Adv. Colloid Interface Sci. 244 (2017) 174–183.
(2011) 696–700. [23] J. Fu, Y. Wang, P.F. Chen, Generation of sub-half-wavelength non-diffracting
[17] A.G. Poleshchuk et al., Polar coordinate laser pattern generator for fabrication beams with tunable depth of focus by focusing azimuthally polarized beams,
of diffractive optical elements with arbitrary structure, Appl. Opt. 38 (8) Appl. Phys. B 123 (7) (2017) 214.
(1999) 1295–1301. [24] J. Steele, H. Yuan, C. Tan, M. Keshavarz, C. Steuwe, M. Roeffaers, J. Hofkens,
[18] H.G. Rhee, D. Kim, S.K. Hong, Y.W. Lee, 300 mm reference wafer fabrication by Direct laser writing of d- to a-phase transformation in Formamidinium lead
using direct laser lithography, Rev. Sci. Instrum. 79 (10) (2008) 103103. Iodide, ACS Nano. 11 (2017) 8072–8083.
[19] H.G. Rhee, D.I. Kim, J.B. Song, H.J. Lee, Y.W. Lee, J.H. Jo, Performance evaluation [25] R. Wang, J. Wei, Y. Fan, Chalcogenide phase-change thin films used as
of laser lithographic machine for computer-generated hologram, Int. J. Adv. grayscale photolithography materials, Opt. Express 22 (2014) 4973–4984.
Manuf. Technol. 52 (9–12) (2010) 1005–1009. [26] M. Mansuripur, Analysis of astigmatic focusing and push–pull tracking error
signals in magnetooptical disk systems, Appl. Optics 26 (1987) 3981–3986.