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MOSFET
A Metal Oxide Semiconductor Field effect transistors,
commonly known as MOSFET, are semiconductor switching
devices that have three terminals which are the gate, drain and
source.
It is used for switching or amplifying signals.
• It is a four-terminal device with Source (S), Drain (D), Gate (G), and
body (B) terminals.
• The body (B) is frequently connected to the source terminal,
reducing the terminals to three.
• It works by varying the width of a channel along which charge
carriers flow (electrons or holes).
• The charge carriers enter the channel at the source and exit via the
drain.
• The width of the channel is controlled by the voltage on an
electrode called Gate which is located between the source and the
drain.
• It is insulated from the channel near an extremely thin layer of
metal oxide.
The classification of MOSFET based on the construction and the material
• The line between the
drain (D) and source (S)
connections show the
semiconductive channel of
the transistor. If the line is
unbroken then it represents
the Depletion type of
MOSFET which is normally
in an ON state as the drain
current can flow with no
gate biasing potential.
Operation of MOSFET
• Based on the construction, MOSFET can be classified into
NMOS and PMOS.
Lets us consider NMOS.
• NMOS consists of a lightly doped p-substrate, and two
heavily doped n-type regions called as Source and drain.
The source and drain terminals are interchangeable.
• The gate terminal is completely insulated from the p-type
substrate by a silicon-oxide layer.
• When a negative voltage is applied to the gate terminal,
an electric field is set up through the silicon-oxide layer.
• This electric field attracts the holes (positively charged
majority carriers) towards the silicon-oxide layer and
repels electrons (negatively charged minority carriers)
away from it.
• At this point, the region below the silicon-oxide layer lacks
electrons.
• This region of charge accumulation is known as
accumulation region Accumulation of holes below silicon
dioxide layer
• At this point, if we apply a small
positive gate voltage, holes are
pushed away from the oxide. At the
same time, the weak electric field will
not be able to attract electrons
toward the oxide region.