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X-ray lithography
- 2. X-Ray Lithography X-Ray Photolithography is a process which uses X-rays to transfer a geometric pattern from a mask to the resist on the substrate. X-rays having wavelengths of 0.04nm to 0.5nm represent another radiation source for high-resolution design reproduction. X-ray lithography can be extended optical resolution of 15 nm.
- 3. Synchrotron X-ray source A synchrotron is an extremely powerful source of X-rays. The X-rays are produced by high energy electrons as they circulate around the synchrotron.
- 4. Procedure of X-Ray Lithography PMMA is applied to the surface of silicon wafer PMMA hardens when contacted with x-rays X-ray mask is applied on top of silicon wafer before exposure Absorber Membrane Synchrotron radiation (0.4 – 4 nm) Gap between substrate and mask
- 5. Applications IC industry Proposed for fabricating Gigabit-level DRAM Not a mainstream technique for IC fabrication Nano electronics MEMS applications High aspect ratio devices
- 6. X-Ray Lithography - Pros Shorter wavelength (0.4 – 4nm) than UV light High penetration, high resolution Minimum feature size around 10 – 20 nm Simple process – can use both positive and negative resists Essentially negligible diffraction Longer mask lifetime than with photolithography
- 7. X-Ray Lithography - Cons Very costly (compared to photolithography) Requires special masks and resists X-ray absorbers: gold and tungsten X-ray membrane: silicon carbide or diamond X-rays cannot be focused -> prevents the use of lenses
- 8. Thank You