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Medium-Grain Niobium SRF Cavity Production Technology for Science Frontiers and Accelerator Applications
Authors:
G. Myneni,
Hani E. Elsayed-Ali,
Md Obidul Islam,
Md Nizam Sayeed,
G. Ciovati,
P. Dhakal,
R. A. Rimmer,
M. Carl,
A. Fajardo,
N. Lannoy,
B. Khanal,
T. Dohmae,
A. Kumar,
T. Saeki,
K. Umemori,
M. Yamanaka,
S. Michizono,
A. Yamamoto
Abstract:
We propose cost-effective production of medium grain (MG) niobium (Nb) discs directly sliced from forged and annealed billet. This production method provides clean surface conditions and reliable mechanical characteristics with sub-millimeter average grain size resulting in stable SRF cavity production. We propose to apply this material to particle accelerator applications in the science and indus…
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We propose cost-effective production of medium grain (MG) niobium (Nb) discs directly sliced from forged and annealed billet. This production method provides clean surface conditions and reliable mechanical characteristics with sub-millimeter average grain size resulting in stable SRF cavity production. We propose to apply this material to particle accelerator applications in the science and industrial frontiers. The science applications require high field gradients (>~40 MV/m) particularly in pulse mode. The industrial applications require high Q0 values with moderate gradients (~30 MV/m) in CW mode operation. This report describes the MG Nb disc production recently demonstrated and discusses future prospects for application in advanced particle accelerators in the science and industrial frontiers.
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Submitted 11 March, 2022;
originally announced March 2022.
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Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering
Authors:
Md Nizam Sayeed,
Uttar Pudasaini,
Charles E. Reece,
Grigory V. Eremeev,
Hani E. Elsayed-Ali
Abstract:
Nb3Sn films were fabricated by multilayer sequential sputtering on Nb at substrate temperatures ranging from room temperature to 250 °C. The multilayers were then annealed inside a separate vacuum furnace at 950 °C for 3h. The films material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmiss…
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Nb3Sn films were fabricated by multilayer sequential sputtering on Nb at substrate temperatures ranging from room temperature to 250 °C. The multilayers were then annealed inside a separate vacuum furnace at 950 °C for 3h. The films material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The films superconducting properties were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature Tc. The highest film Tc was 17.76 K, obtained when the multilayers were deposited at room temperature. A superconducting Nb3Sn thin film with a smoother surface morphology but a lower Tc of 17.58 K was obtained on the film deposited at a substrate temperature of 250 °C.
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Submitted 19 April, 2022; v1 submitted 15 September, 2021;
originally announced September 2021.
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Properties of Nb3Sn films fabricated by magnetron sputtering from a single target
Authors:
Md. Nizam Sayeed,
Uttar Pudasaini,
Charles E. Reece,
Grigory V. Eremeev,
Hani E. Elsayed-Ali
Abstract:
Superconducting Nb3Sn films were fabricated on sapphire and fine grain Nb substrates by magnetron sputtering from a single stoichiometric Nb3Sn target. The structural, morphological and superconducting properties of the films annealed for 24 h at temperatures of 800-1000 °C were investigated. The effect of the annealing time at 1000 °C was examined for 1, 12, and 24 h. The film properties were cha…
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Superconducting Nb3Sn films were fabricated on sapphire and fine grain Nb substrates by magnetron sputtering from a single stoichiometric Nb3Sn target. The structural, morphological and superconducting properties of the films annealed for 24 h at temperatures of 800-1000 °C were investigated. The effect of the annealing time at 1000 °C was examined for 1, 12, and 24 h. The film properties were characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy, energy dispersive X-ray spectroscopy, and Raman spectroscopy. The DC superconducting properties of the films were characterized by a four-point probe measurement down to cryogenic temperatures. The RF surface resistance of films was measured over a temperature range of 6-23 K using a 7.4 GHz sapphire-loaded Nb cavity. As-deposited Nb3Sn films on sapphire had a superconducting critical temperature of 17.21 K, which improved to 17.83 K when the film was annealed at 800 °C for 24 h. For the films annealed at 1000 °C, the surface Sn content was reduced to ~11.3 % for an annealing time of 12 h and to ~4.1 % for an annealing time of 24 h. The Raman spectra of the films confirmed the microstructural evolution after annealing. The RF superconducting critical temperature of the as-deposited Nb3Sn films on Nb was 16.02 K, which increased to 17.44 K when the film was annealed at 800 °C for 24 h.
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Submitted 14 July, 2020;
originally announced July 2020.
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Effect of layer thickness on structural, morphological and superconducting properties of Nb$_3$Sn films fabricated by multilayer sequential sputtering
Authors:
Md Nizam Sayeed,
Uttar Pudasaini,
Charles E Reece,
Grigory V Eremeev,
Hani E Elsayed-Ali
Abstract:
Superconducting Nb3Sn films can be synthesized by controlling the atomic concentration of Sn. Multilayer sequential sputtering of Nb and Sn thin films followed by high temperature annealing is considered as a method to fabricate Nb3Sn films, where the Sn composition of the deposited films can be controlled by the thickness of alternating Nb and Sn layers. We report on the structural, morphological…
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Superconducting Nb3Sn films can be synthesized by controlling the atomic concentration of Sn. Multilayer sequential sputtering of Nb and Sn thin films followed by high temperature annealing is considered as a method to fabricate Nb3Sn films, where the Sn composition of the deposited films can be controlled by the thickness of alternating Nb and Sn layers. We report on the structural, morphological and superconducting properties of Nb3Sn films fabricated by multilayer sequential sputtering of Nb and Sn films on sapphire substrates followed by annealing at 950 °C for 3 h. We have investigated the effect of Nb and Sn layer thickness and Nb:Sn ratio on the properties of the Nb3Sn films. The crystal structure, surface morphology, surface topography, and film composition were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy dispersive X-ray spectroscopy (EDS). The results showed Sn loss from the surface due to evaporation during annealing. Superconducting Nb3Sn films of critical temperature up to 17.93 K were fabricated.
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Submitted 22 April, 2020;
originally announced April 2020.
