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Showing 1–2 of 2 results for author: Sanchez-Cortes, S

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  1. arXiv:2304.13621  [pdf

    physics.app-ph

    Influence of Heat Accumulation on Morphology Debris Deposition and Wetting of LIPSS on Steel upon High Repetition Rate Femtosecond Pulses Irradiation

    Authors: Camilo Florian, Yasser Fuentes-Edfuf, Evangelos Skoulas, Emmanuel Stratakis, Santiago Sanchez-Cortes, Javier Solis, Jan Siegel

    Abstract: The fabrication of laser-induced periodic surface structures (LIPSS) over extended areas at high processing speeds requires the use of high repetition rate femtosecond lasers. It is known that industrially relevant materials such as steel experience heat accumulation when irradiated at repetition rates above some hundreds of kHz, and significant debris redeposition can take place. However, there a… ▽ More

    Submitted 26 April, 2023; originally announced April 2023.

    Journal ref: https://www.mdpi.com/1996-1944/15/21/7468

  2. arXiv:2002.08259  [pdf, other

    cond-mat.mtrl-sci physics.app-ph

    Influence of the growth conditions on the magnetism of SrFe$_{12}$O$_{19}$ thin films and the behavior of Co / SrFe$_{12}$O$_{19}$ bilayers

    Authors: G. D. Soria, J. F. Marco, A. Mandziak, S. Sánchez-Cortés, M. Sánchez-Arenillas, J. E. Prieto, J. Dávalos, M. Foerster, L. Aballe, J. López-Sánchez, J. C. Guzmán-Mínguez, C. Granados-Miralles, J. de la Figuera, A. Quesada

    Abstract: SrFe$_{12}$O$_{19}$ (SFO) films grown on Si (100) substrates by radio-frequency magnetron sputtering have been characterized in terms of composition, structural and magnetic properties by a combination of microscopy, diffraction and spectroscopy techniques. Mössbauer spectroscopy was used to determine the orientation of the films magnetization, which was found to be controlled by both the sputteri… ▽ More

    Submitted 8 May, 2020; v1 submitted 19 February, 2020; originally announced February 2020.

    Comments: 17 pages, 11 figures. Submitted to Journal of Physics D: Applied Physics. Second version, improved after first round of reviews

    Journal ref: J. Phys. D: Appl. Phys. 53, 344002 (2020)