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Modeling of layout-dependent stress effect in CMOS design

Published: 02 November 2009 Publication History

Abstract

Strain technology has been successfully integrated into CMOS fabrication to improve carrier transport properties since 90nm node. Due to the non-uniform stress distribution in the channel, the enhancement in carrier mobility, velocity, and threshold voltage shift strongly depend on circuit layout, leading to systematic performance variations among transistors. A compact stress model that physically captures this behavior is essential to bridge the process technology with design optimization. In this paper, starting from the first principle, a new layout-dependent stress model is proposed as a function of layout, temperature, and other device parameters. Furthermore, a method of layout decomposition is developed to partition the layout into a set of simple patterns for efficient model extraction. These solutions significantly reduce the complexity in stress modeling and simulation. They are comprehensively validated by TCAD simulation and published Si-data, including the state-of-the-art strain technologies and the STI stress effect. By embedding them into circuit analysis, the interaction between layout and circuit performance is well benchmarked at 45nm node.

References

[1]
The International Technology Roadmap for Semiconductors (ITRS), 2008.
[2]
K. Rim, "Fabrication and analysis of deep submicron strained-Si N-MOSFET's," TED, Vol. 47, no. 7, pp. 1406--1415, July 2000.
[3]
J-S Lim, et al., "Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs," EDL, vol. 25, no. 11, pp. 731--733, Nov. 2004.
[4]
H. Nii, et al., "A 45nm High Performance Bulk Logic Platform Technology (CMOS6) using Ultra High NA(1.07) Immersion Lithography with Hybrid Dual-Damascene Structure and Porous Low-k BEOL," in IEDM, pp. 685--688, 2006
[5]
K. Ota, et al., "Novel locally strained channel technique for high performance 55nm CMOS," in IEDM, pp. 27--30, 2002.
[6]
G. Scott, et al., "NMOS drive current reduction caused by transistor layout and trench isolation induced stress," in IEDM Tech. Dig., 1999, pp. 827--830.
[7]
R. A. Bianchi, et al., "Accurate modeling of trench isolation induced mechanical stress effects on MOSFET electrical performance," IEDM, pp. 117--120, 2002.
[8]
H. Aikawa, et al., "Variability aware modeling and characterization in standard cell in 45 nm CMOS with stress enhancement technique," in IEEE VLSI Symp, pp. 90--91, 2008.
[9]
G. Eneman, et al., "Scalability of the Si1-xGex Source/Drain technology for the 45-nm technology node and beyond," TED, vol. 53, no. 7, pp. 1647--1656, Jul. 2006.
[10]
Taurus Tsuprem4, Manual, Oct. 2005. Version X-2005. 10.
[11]
V. Moroz, et al., "The impact of layout on stress-enhanced transistor performance," pp. 143--146, SISPAD 2005.
[12]
A. B. Kahng, et al., "Exploiting STI stress for performance," pp. 83--90, ICCAD, 2007
[13]
V. Joshi, et al., "Leakage power reduction using stress-enhanced layouts," pp. 912--917, DAC 2008.
[14]
K-W Su, et al., "A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics," Custom Integrated Circuits Conference, pp. 245--248, 2003.
[15]
BSIM4 Manual, Univ. California, Berkeley, CA, 2005.
[16]
C. E. Murray, "Mechanics of edge effects in anisotropic thin film/substrate systems," Journal of Applied Physics, vol. 100, 103532, 2006.
[17]
M. V. Dunga, et al., "Modeling advanced FET technology in a compact model," TED, vol. 53, No. 9, pp. 1971--1978, Sept. 2006.
[18]
Taurus Medici, Manual, June 2006. Version Y-2006.06.
[19]
Xi-Wei Lin, "Modeling of Proximity Effects in Nanometer MOS-FET's," IEEE/ACM Workshop on Compact Variability Modeling 2008.
[20]
C. S. Smith, "Piezoresistance effect in Germanium and Silicon," Phys. Rev., Vol. 94, no. 1, pp. 42--49, 1954.
[21]
Y. Kanda, at el., "A graphical representation of the piezoresistance coefficients in silicon," TED, vol. 29, No. 1, pp. 64--70, Jan. 1982.
[22]
E. Ungersboeck, st al., "The effect of general strain on the band structure and electron mobility of silicon," TED, vol. 54, No. 9, pp. 2183--2190, Sept. 2007.
[23]
J. L. Egley and D. Chidambarrao, "Strain Effects on Device Characteristics: Implementation in Drift-Diffusion Simulators," SolidState Electronics, 36(12), pp. 1653--1664, 1993.
[24]
Sentaurus Device, Manual, June 2005. Version Y-2006. 06.
[25]
G. L. Bir and G. E. Pikus, Symmetry and Strain-Induced Effects in Semiconductors, Wiley, New York, 1974.
[26]
F. Payet, et al., "Nonuniform Mobility-Enhancement Techniques and Their Impact on Device Performance," TED, Vol. 55, no. 4, pp. 1050--1057, April 2008
[27]
D. Sinitsky, "Physics of future very large-sclae integration (VLSI) MOSFETs," Ph.D. dissertation, Univ. California, Berkeley, CA, 1997.
[28]
W. Zhang, et al., "On the threshold voltage of strained-Si-Si1-xGex MOSFETs," TED, Vol. 52, no. 2, pp. 263--268, Feb. 2005.
[29]
S. M. Sze, Semiconductor Devices: Physics and Technology, 2nd ed., New York: John Wiley & Sons, 2002.
[30]
Z.-H. Liu, et al., "Threshold Voltage Model for Deep-Submicrometer MOSFET's," TED, Vol. 40, no. 1, pp. 86--95, Jan. 1993.
[31]
W. Zhao, et al., "New generation of predictive technology model for sub-45nm design exploration," IEEE TED, vol. 53, no. 11, pp. 2816--2823, Nov. 2006. (Available at http://www.eas.asu.edu/~ptm)
[32]
A. R. Subramaniam, et al., "Design Rule Optimization of Regular Layout for Leakage Reduction in Nanoscale Design," in ASP-DAC, pp. 474--479, 2008.
[33]
H. Tsuno, et al., "Advanced analysis and modeling of MOSFET characteristic fluctuation caused by layout variation," in IEEE VLSI Symp, pp. 204--205, 2007.
[34]
F. Andrieu, et al., "Experimental and Comparative Investigation of Low and High Field Transport in Substrate- and Process-Induced Strained Nanoscaled MOSFETs," in IEEE VLSI Symp, pp. 176--177, 2005.
[35]
Marc J. Madou, "Fundamentals of microfabrication: the science of miniaturization," pp. 198, CRC Press, 2nd edition, 2002.

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cover image ACM Conferences
ICCAD '09: Proceedings of the 2009 International Conference on Computer-Aided Design
November 2009
803 pages
ISBN:9781605588001
DOI:10.1145/1687399
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Publication History

Published: 02 November 2009

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Author Tags

  1. layout dependence
  2. mobility
  3. pattern decomposition
  4. stress effect
  5. stress modeling

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  • (2021)Bridging TCAD and AI: Its Application to Semiconductor DesignIEEE Transactions on Electron Devices10.1109/TED.2021.309384468:11(5364-5371)Online publication date: Nov-2021
  • (2018)Physical, Electrical, and Reliability Considerations for Copper BEOL Layout Design RulesJournal of Low Power Electronics and Applications10.3390/jlpea80200208:2(20)Online publication date: 14-Jun-2018
  • (2018)Effective Drive Current for Near-Threshold CMOS Circuits’ Performance Evaluation: Modeling to Circuit Design TechniquesIEEE Transactions on Electron Devices10.1109/TED.2018.282534165:6(2413-2421)Online publication date: Jun-2018
  • (2018)UTBB FD-SOI Circuit Design using Multifinger Transistors: A Circuit-Device Interaction Perspective2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)10.1109/PRIME.2018.8430312(57-60)Online publication date: Jul-2018
  • (2017)Effective Current Model for Inverter-Transmission Gate Structure and Its Application in Circuit DesignIEEE Transactions on Electron Devices10.1109/TED.2017.274235864:10(4002-4010)Online publication date: Oct-2017
  • (2016)Layout-Dependent Effects-Aware Analytical Analog PlacementIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2015.250129335:8(1243-1254)Online publication date: 1-Aug-2016
  • (2016)A variation aware timing model for a 2-input NAND gate and its use in sub-65nm CMOS standard cell characterizationMicroelectronics Journal10.1016/j.mejo.2016.03.01053(45-55)Online publication date: Jul-2016
  • (2015)Layout-dependent-effects-aware analytical analog placementProceedings of the 52nd Annual Design Automation Conference10.1145/2744769.2744865(1-6)Online publication date: 7-Jun-2015
  • (2015)A framework for thermal aware reliability estimation in 2D NoC2015 19th International Symposium on VLSI Design and Test10.1109/ISVDAT.2015.7208063(1-6)Online publication date: Jun-2015
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