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Frame field generation through metric customization

Published: 27 July 2015 Publication History

Abstract

This paper presents a new technique for frame field generation. As generic frame fields (with arbitrary anisotropy, orientation, and sizing) can be regarded as cross fields in a specific Riemannian metric, we tackle frame field design by first computing a discrete metric on the input surface that is compatible with a sparse or dense set of input constraints. The final frame field is then found by computing an optimal cross field in this customized metric. We propose frame field design constraints on alignment, size, and skewness at arbitrary locations on the mesh as well as along feature curves, offering much improved flexibility over previous approaches. We demonstrate the advantages of our frame field generation through the automatic quadrangulation of man-made and organic shapes with controllable anisotropy, robust handling of narrow surface strips, and precise feature alignment. We also extend our technique to the design of n-vector fields.

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      cover image ACM Transactions on Graphics
      ACM Transactions on Graphics  Volume 34, Issue 4
      August 2015
      1307 pages
      ISSN:0730-0301
      EISSN:1557-7368
      DOI:10.1145/2809654
      Issue’s Table of Contents
      Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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      Publication History

      Published: 27 July 2015
      Published in TOG Volume 34, Issue 4

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      Author Tags

      1. n-vector field design
      2. frame field generation
      3. geometry processing
      4. metric customization

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