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    S. Vogt

    Abstract Integration and development of Cu Back-End of Line (BEOL) with PECVD low-k organosilicate glass (OSG, also called SiCOH, carbon-doped oxide, CDO, etc.) for 130 nm and 90 nm CMOS technologies has been reported by a number of... more
    Abstract Integration and development of Cu Back-End of Line (BEOL) with PECVD low-k organosilicate glass (OSG, also called SiCOH, carbon-doped oxide, CDO, etc.) for 130 nm and 90 nm CMOS technologies has been reported by a number of institutions. Here we ...
    We report a novel experimental approach to derive quantitative concentration map of light elements in whole cells by combining two complementary nano-probe methods: X-ray fluorescence microscopy (XRFM) and atomic force microscopy (AFM).... more
    We report a novel experimental approach to derive quantitative concentration map of light elements in whole cells by combining two complementary nano-probe methods: X-ray fluorescence microscopy (XRFM) and atomic force microscopy (AFM). The concentration ...
    We report on a type of linear zone plate for nanometer-scale focusing of hard x rays, a multilayer Laue lens (MLL), produced by sectioning a multilayer and illuminating it in Laue diffraction geometry. Because of its large optical depth,... more
    We report on a type of linear zone plate for nanometer-scale focusing of hard x rays, a multilayer Laue lens (MLL), produced by sectioning a multilayer and illuminating it in Laue diffraction geometry. Because of its large optical depth, a MLL spans the diffraction regimes applicable to a thin Fresnel zone plate and a crystal. Coupled wave theory calculations indicate that focusing to 5 nm or smaller with high efficiency should be possible. Partial MLL structures with outermost zone widths as small as 10 nm have been fabricated and tested with 19.5 keV synchrotron radiation. Focal sizes as small as 30 nm with efficiencies up to 44% are measured.
    We are developing a new hard x-ray nanoprobe beamline with 30 nm resolution at the Advanced Photon Source (APS). Imaging and spectroscopy at this resolution level require staging of x-ray optics and specimens with a mechanical... more
    We are developing a new hard x-ray nanoprobe beamline with 30 nm resolution at the Advanced Photon Source (APS). Imaging and spectroscopy at this resolution level require staging of x-ray optics and specimens with a mechanical repeatability of better than 10 nm. We have developed a prototype instrument with a novel interferometrically controlled scanning stage system. The system consists of nine DC-motor-driven stages, four picomotor-driven stages, and two PZT-driven stages. An APS-designed custom-built laser Doppler displacement meter system provides two-dimensional differential displacement measurement with subnanometer resolution between the zone-plate x-ray optics and the sample holder. Also included is the alignment and stable positioning of two stacked zone plates for increasing the focusing efficiency. The entire scanning system was designed with high stiffness, high repeatability, low drift, flexible scanning schemes, and possibility of fast feedback for differential motion....
    Abstract We report a comprehensive characterization of a 90 nm CMOS technology with Cu/SiCOH low-k interconnect BEOL. Significant material and integration engineering have led to the highest reliability, without degrading the performance... more
    Abstract We report a comprehensive characterization of a 90 nm CMOS technology with Cu/SiCOH low-k interconnect BEOL. Significant material and integration engineering have led to the highest reliability, without degrading the performance expected from low-k. ...