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    Scott Chambers

    This article introduces the October 2003 issue of MRS Bulletin on “New Materials for Spintronics.” As a result of quantum mechanics, the carriers in ferromagnetic metals such as Fe, Co, and Ni are spin-polarized due to an imbalance at the... more
    This article introduces the October 2003 issue of MRS Bulletin on “New Materials for Spintronics.” As a result of quantum mechanics, the carriers in ferromagnetic metals such as Fe, Co, and Ni are spin-polarized due to an imbalance at the Fermi level in the number of spin-up and spin-down electrons. A carrier maintains its spin polarization as long as it does not encounter a magnetic impurity or interact with the host lattice by means of spin-orbit coupling. The discovery of optically induced, long-lived quantum coherent spin states in semiconductors has created a range of possibilities for a new class of devices that utilize spin. This discovery also points to the need for a wider range of spin-polarized materials that will be required for different device configurations. In this issue of MRS Bulletin, we focus on three classes of candidate spintronic materials and review the current state of our understanding of them: III–V and II–VI semiconductors, oxides, and Heusler alloys. The...
    ... We use the results of these fits to obtain as a function of wavelength, and then calculatealpha . In Fig. alpha for both the thin and thick films is shown; notice that for energies under the values for the thin film are larger than... more
    ... We use the results of these fits to obtain as a function of wavelength, and then calculatealpha . In Fig. alpha for both the thin and thick films is shown; notice that for energies under the values for the thin film are larger than those for the thick film. ...
    ... Rev. B 52 (1995) 17449. [17] YJ Kim, Ph.D. Thesis, Department of Chemistry, Univer-sity of Hawaii, USA, 1995. I-18] HC Galloway, JJ Benitez and M. Salmeron, J. Vac. Sci. Technol. ... 1 81 (1985) 1263. 1-22] FC Voogt, T. Hibma, GL... more
    ... Rev. B 52 (1995) 17449. [17] YJ Kim, Ph.D. Thesis, Department of Chemistry, Univer-sity of Hawaii, USA, 1995. I-18] HC Galloway, JJ Benitez and M. Salmeron, J. Vac. Sci. Technol. ... 1 81 (1985) 1263. 1-22] FC Voogt, T. Hibma, GL Zhang, M. Hoefman and L Niesen, Surf. Sci. ...
    ... Electrons from these states may constitute the active ingredient in the increased photocatalytic activity observed for mixed Nb,O,/TiO, powders relative to pure TiO,. ... JF Baumard and E. Tani, J. Chem. Phys. 67 (1977) 857. SA... more
    ... Electrons from these states may constitute the active ingredient in the increased photocatalytic activity observed for mixed Nb,O,/TiO, powders relative to pure TiO,. ... JF Baumard and E. Tani, J. Chem. Phys. 67 (1977) 857. SA Chambers, TT Tran and TA Hileman. J. Mater. Res. ...
    We grew epitaxial α–Fe2O3(1010) on TiO2(001) rutile by oxygen plasma-assisted molecular-beam epitaxy. High-resolution transmission electron microscopy (HRTEM), reflection high-energy electron diffraction (RHEED), and x-ray diffraction... more
    We grew epitaxial α–Fe2O3(1010) on TiO2(001) rutile by oxygen plasma-assisted molecular-beam epitaxy. High-resolution transmission electron microscopy (HRTEM), reflection high-energy electron diffraction (RHEED), and x-ray diffraction pole figures confirm that the film is composed of four different in-plane orientations rotated by 90° relative to one another. For a given Fe2O3 unit cell, the lattice mismatch along the parallel [0001]Fe2O3 and [100]TiO2 directions is nominally +67%. However, due to a 3-fold repetition of the slightly distorted square symmetry of anion positions within the Fe2O3 unit cell, there is a coincidental anion alignment along the [0001]Fe2O3 and [100]TiO2 directions, which results in an effective lattice mismatch of only −0.02% along this direction. The lattice mismatch is nearly 10% in the orthogonal [1120]Fe2O3 and [100]TiO2 directions. The film is highly ordered and well registered to the substrate despite a large lattice mismatch in one direction. The fil...
    Pure anatase TiO2 and CoxTi1-xO2 (0.01<x<0.04) epitaxial thin films were deposited by oxygen-plasma-assisted molecular beam epitaxy on Si(001) for evaluation as a potential dilute magnetic semiconductor material suitable for... more
    Pure anatase TiO2 and CoxTi1-xO2 (0.01<x<0.04) epitaxial thin films were deposited by oxygen-plasma-assisted molecular beam epitaxy on Si(001) for evaluation as a potential dilute magnetic semiconductor material suitable for Si-based spintronic devices. Epitaxial growth on Si(001) was facilitated by the deposition of 1/4 or 1/2 ML Sr metal on the clean Si(001) surface to form an oxidation resistant silicide layer, followed by deposition of a thin SrTiO3 buffer layer. Using 1/2 ML Sr metal to form the silicide allowed the deposition of 10 ML SrTiO3 without oxidation of the Si interface. Epitaxial anatase could be grown on this heterostructure, although use of the oxygen plasma during deposition resulted in significant SiO2 formation. Pure anatase films consisted of epitaxial anatase surface particles on a continuous anatase film. For Co-doped films, Co segregation to surface particles of epitaxial anatase was observed by Auger electron spectroscopy and transmission electron microscopy (TEM); faceting of the particles was observed for low Co doping concentrations. Although no secondary phases containing Co were observed in Co-doped anatase films by x-ray diffraction or TEM, x-ray absorption near edge spectroscopy indicated Co was present in the films as a mixture of Co(0), Co(II), and Co(III). All samples were ferromagnetic at room temperature; for lower Co concentrations, the ferromagnetic remanence (9%) and coercive field (100 Oe) were similar to phase-pure Co:TiO2/LaAlO3. However, the presence of Co(0) under strongly oxidizing growth conditions known to oxidize the Si interface implies that under no deposition conditions can Co metal be eliminated while simultaneously protecting the Si interface from oxidation.
    ABSTRACT
    We have used plasma-assisted molecular beam epitaxy to synthesize structurally near-perfect crystalline films of TiO2−xNx rutile for the first time. These materials allow the properties of TiO2−xNx to be elucidated without the interfering... more
    We have used plasma-assisted molecular beam epitaxy to synthesize structurally near-perfect crystalline films of TiO2−xNx rutile for the first time. These materials allow the properties of TiO2−xNx to be elucidated without the interfering effects of bulk substoichiometric defects that have characterized previous investigations. In the absence of such defects, the extent of N incorporation in the lattice is limited to
    We have used photoemission methods to directly measure the valence and conduction band offsets at SrTiO3/Si(001) interfaces, as prepared by molecular-beam epitaxy. Within experimental error, the measured values are the same for growth on... more
    We have used photoemission methods to directly measure the valence and conduction band offsets at SrTiO3/Si(001) interfaces, as prepared by molecular-beam epitaxy. Within experimental error, the measured values are the same for growth on n- and p-Si, with the entire band discontinuity occurring at the valence band edge. In addition, band bending is much larger at the p-Si heterojunction than at the n-type heterojunction. Previously published threshold voltage behavior for these interfaces can now be understood in light of the present results.
    ABSTRACT
    Clusters and magnetism in epitaxial Co-doped TiO anatase. [Applied Physics Letters 82, 1257 (2003)]. SA Chambers, T. Droubay, CM Wang, AS Lea, RFC Farrow, L. Folks, V. Deline, S. Anders. Abstract. ... Magnetic properties of... more
    Clusters and magnetism in epitaxial Co-doped TiO anatase. [Applied Physics Letters 82, 1257 (2003)]. SA Chambers, T. Droubay, CM Wang, AS Lea, RFC Farrow, L. Folks, V. Deline, S. Anders. Abstract. ... Magnetic properties of nanostructures. Body. ...
    ... J. Kim, Mater. Today 5, 24 (2002). BT Jonker, YD Park, BR Bennett, HD Cheong, G. Kioseoglou, and A. Petrou, “Robust electrical spin injection into a semiconductor heterostructure,” Phys. Rev. B 62, 8180 (2000). YD Park, AT ...