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2019, Materials Science: Materials Review
Laser based efficient new nanofabrication methods with technical feasibility for the fast uptake in industrial application are of significant global demand. A recent simplest approach in this way is the standard pulsed laser deposition (PLD), used since 1960s after the development of high power lasers. Over all, PLD is a fit method towards the preparation of a variety of nanomaterials only for research purpose. Nevertheless, the method is relatively slow and could not adopted in industrial scale application. A recent new-fangled development in this direction is the atmospheric-PLD (APLD), where ablation of the target by a laser pulse occurs at atmospheric gas pressure and the ablated material is delivered to the substrate using a flowing medium such as gas or atmospheric plasma. With this method, a variety of nanomaterials such as plasmonic metal NP film could be produced for practical ap
Applied Physics A
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Lithuanian Journal of Physics
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Pulsed laser ablation is a simple, but versatile, experimental method that finds use as a means of patterning a very diverse range of materials, and in wide areas of thin film deposition and multi-layer research. Superficially, at least, the technique is conceptually simple also, but this apparent simplicity hides a wealth of fascinating, and still incompletely understood, chemical physics. This overview traces our current physico-chemical understanding of the evolution of material from target ablation through to the deposited film, addressing the initial laser-target interactions by which solid material enters the gas phase, the processing and propagation of material in the plume of ejected material, and the eventual accommodation of gas phase species onto the substrate that is to be coated. It is intended that this Review be of interest both to materials scientists interested in thin film growth, and to chemical physicists whose primary interest is with more fundamental aspects of the processes of pulsed laser ablation and deposition.
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