Atomic Layer Deposition
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Recent papers in Atomic Layer Deposition
Physical instability remains a major concern with amorphous solid dispersions (ASDs). In addition to bulk crystallization inhibition, another potential strategy to improve the physical stability of ASDs is surface engineering. However,... more
Психотронни изследвания на микросвета atom structure
Many fields including the aerospace industry have shown increased interest in the use of plastics to lower the mass of systems. However, the use of plastics in space can be challenging for a number of reasons. Ultraviolet radiation,... more
In this paper, we report the plasma-enhanced atomic layer deposition (PEALD) of TiO 2 and TiO 2 /Al 2 O 3 nanolaminate films on p-Si(100) to fabricate metal-oxide-semiconductor (MOS) capacitors. In the PEALD process, we used titanium... more
The phenomenon of quantum entanglement involving two particles has puzzled us for a long time. This article presents some possible solutions.
We investigated the effectiveness of SiN and SiON barrier layer in controlling the interfacial reaction between Atomic Layer Deposited (ALD) HfO2 film and the Si substrate. The HfO2 film was found to form silicate and silicide at the... more
Atomic Layer Deposition (ALD) method has been used to synthesis nanocoatings thin films of Alumina, Titania, and Alumina/Titania multilayer on stainless steel AISI 316L at 250 °C deposition temperatures for the medical applications.... more
Aluminum-doped p-type (Al-p+) silicon emitters fabricated by means of screen-printing and firing are effectively passivated by plasma-enhanced chemical-vapor deposited (PECVD) amorphous silicon (a-Si) and atomic-layer-deposited (ALD)... more
Nanoscale films of tungsten nitride (WN) were deposited as environmental barrier coatings (EBCs) by particle atomic layer deposition (ALD) on zirconia nanoparticles and yttria stabilized zirconia micropowders. Hydrogen diffusion in... more
In this paper, theoretical and experimental approaches were used to evaluate the impact of the precursor's pulse time on the growth per cycle and the crystallinity quality of atomic layer deposited TiO 2 thin films on Si(100) and FTO... more
Atomic Layer Deposition (ALD) has been used to deposit Titanium Dioxide (TiO2) and Aluminum Oxide (Al2O3) thin film on stainless steel and Si-wafer (100) substrates. For TiO2, Tetrakis (dimethylamido) titanium (TDMAT) {Ti (NMe2)4} was... more
Introduction: Silver, prized throughout history for its luster and shine, develops a black Ag 2 S tarnish layer that is aesthetically displeasing when exposed to atmospheric pollutants. Tarnishing, and subsequent polishing, leads to... more
DOWN AROUND PLANCK LENGTH, THE ORIGINAL AETHER HAS TO BE CIRCULAR DUE TO THE RULE. = SPIN. THE VERY SMALLEST AETHERS ARE CIRCULAR AND NESTED CONCENTRIC,
• TiO 2 thin films with brookite phase successfully deposited on Si(111) using ALD. • Correlated Structural and optical properties perceived and studied. • Reduction of refractive index observed for films with ultra-small thicknesses. In... more
Carbothermic reduction in the chemistry of metal extraction (MO(s) + C(s) → M(s) + CO(g)) using carbon as a sacrificial agent has been used to smelt metals from diverse oxide ores since ancient times. Here, we paid attention to another... more
We report highly selective emitters based on high-aspect ratio 2D photonic crystals (PhCs) fabricated on large area (2 inch diameter) polycrystalline tantalum substrates, suitable for high-temperature operation. As an example we present... more
Aluminium oxide and titanium oxide films were deposited using the Atomic Layer Deposition method on n-type 4H SiC and p-type Si {001} substrates, with doping 6×1015cm-3 and 2×1016cm-3, respectively, and on 1.2 kV PiN 4H SiC diodes for... more