Detailed MOS Gate Capacitance Model: Chapter 2 MOS Transistor Theory
Detailed MOS Gate Capacitance Model: Chapter 2 MOS Transistor Theory
Detailed MOS Gate Capacitance Model: Chapter 2 MOS Transistor Theory
2.8(a), each source and drain has its own isolated region of contacted diffusion. In Figure
2.8(b), the drain of the bottom transistor and source of the top transistor form a shared
contacted diffusion region. In Figure 2.8(c), the source and drain are merged into an
uncontacted region. The average capacitance of each of these types of regions can be cal-
culated or measured from simulation as a transistor switches between VDD and GND.
Table 8.5 also lists the capacitance for each scenario for a variety of processes.
For the purposes of hand estimation, you can observe that the diffusion capacitance
Csb and Cdb of contacted source and drain regions is comparable to the gate capacitance
(e.g., 1–2 f F /Rm of gate width). The diffusion capacitance of the uncontacted source or
drain is somewhat less because the area is smaller but the difference is usually unimportant
for hand calculations. These values of Cg = Csb = Cdb ~ 1f F /Rm will be used in examples
throughout the text, but you should obtain the appropriate data for your process using
methods to be discussed in Section 8.4.