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Circuits and Electronic Devices: Lecture No

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Ghulam Ishaq Khan Institute of Engineering Sciences and

Technology, Topi, Pakistan

ME203
Circuits and Electronic Devices

Lecture No: 26

Instructor
Dr. Abid Imran
------Faculty of Mechanical Engineering------ Fall Semester
1 2020
Content

• Dc load lines
• MOSFET
• E-type (enhancement/ depletion mode)
• D-type (enhancement/ depletion mode)
Dc load line:

0
• In cutoff region
  𝑉
  𝐶𝐸 =𝑉 𝐶𝐶

• In Saturation region.
0
  𝑉 𝐶𝐶
  𝐼 𝐶 (𝑠𝑎𝑡 )=
𝑅𝐶
• Different operating point based on base current
  • Load line can be changed by changing the or

• Operating point need to be selected very carefully for amplification


Dc load line:
• we assign three values to IB and observe what happens to IC
and VCE.

  • Find  𝐼 𝐶 =𝐼 𝐵 𝛽 𝐷𝐶

  • Find  

𝐼  𝐶 =20 𝑚𝐴
  For
 

𝐼  𝐶 =30 𝑚𝐴
  For
 

𝐼  𝐶 =40 𝑚𝐴
  For
 
  For
𝐼  𝐶 =20 𝑚𝐴
 

  For

𝐼  𝐶 =30 𝑚𝐴
 

  For

𝐼  𝐶 =40 𝑚𝐴
 
Dc load line:
  𝑉 𝐶𝐶
𝐼 𝐶 (𝑎𝑠𝑡)=
𝑅𝐶

𝑉
  𝐶𝐸 =𝑉 𝐶𝐶
Linear amplification (Linear region)
Linear Operation

• The region along the load line between saturation and cutoff is generally known as the linear
region.
• In this region, the output voltage is ideally a linear reproduction of the input.
Distortion
Distorsion

Too close to saturation region Too close to cutoff region


Example: Determine the Q-point for the circuit in Figure and draw the dc load
line. Find the maximum peak value of base current for linear operation.
Assume  𝛽 𝐷𝐶 =200

• Base current

• Collector current

• Output voltage 𝑉 𝐶𝐶
𝐼  𝐶 (𝑎𝑠𝑡 )= =60.6 𝑚𝐴
𝑅𝐶
• Collector current can be increased ideally in linear region

• Collector current is being controlled by base current so 𝑉  𝐶𝐸 =𝑉 𝐶𝐶

Can be increased/
Decreased
Metal
Oxide
Semiconductor
Field
Effect
Transistor
1 Current control device Voltage Controlled device
2 low input impedance High input impedance
3 low thermal stability better thermal stability
4 low switching speed high switching speed
5 more noisy less noisy
6 difficult to fabricate on easy to fabricate
IC
Construction of MOSFET

Metal Oxide Semiconductor Field


Effect Transistor

E MOSFET
Symbols of MOSFET

G
S
Basis working principle of E-MOSFET (N channel)
The MOSFET
• The metal oxide semiconductor field effect transistor (MOSFET) is the second category of FETs.
• There are depletion MOSFETs (D-MOSFET) and enhancement MOSFETs (E-MOSFET). Note the
difference in construction. The E-MOSFET has no structural channel.

Representation of the basic E-MOSFET construction Representation of the basic structure of


and operation (n-channel). D-MOSFETs.
The MOSFET – Enhancement MOSFET (E-MOSFET)
• The E-MOSFET operates only in the enhancement mode and has no depletion mode.
• For n-channel device, a positive gate voltage above threshold value are needed
E-MOSFET Transfer Characteristic
• The E-MOSFET for all practical purposes does not conduct until VGS reaches the threshold voltage (VGS(th)).
• ID when it is when conducting can be determined by the formulas below.
• K = ID(on) /(VGS - VGS(th))2 ID = K(VGS - VGS(th))2

• An n-channel device requires a positive gate-to-source voltage,


• and a p-channel device requires a negative gate-to-source voltage.
Ex. 7-9 The data sheet for a 2N7008 E-MOSFET gives ID(on)= 500 mA (minimum) at VGS = 10 V and VGS(th) = 1 V.
Determine the drain current for VGS = 5 V.

First, solve for K using Equation,

I D ( on) 500 mA 500 mA


K    6. 17 mA / V 2

(VGS  VGS ( th) ) 2 10 V  1V  2 81V 2

Next, using the value of K, calculate ID for VGS = 5 V.

I D  K (VGS  VGS (th ) ) 2


 (6.17 mA / V 2 )(5V  1V ) 2  98.7 mA
BOOK: Electronic Devices, electron flow version.
SECTIONS: 5-1, 8-5

Relevant examples.

19

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