Resists
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Recent papers in Resists
A novel feature region selection method for robust digital image watermarking is proposed in this paper. This method aims to select a nonoverlapping feature region set, which has the greatest robustness against various attacks and can... more
The photolithography process is one of the most complex operations in semiconductor production. Exposure energy definition is particularly critical because it strongly affects the operation results. Very complex links exist between... more
This paper describes how to use a positive deviance-inspired process for improving the practice of systems engineering, and how positive deviance fits into an evolutionary improvement strategy. It illustrates the process with examples... more
A detailed process characterization of SML electron beam resist for high-aspect-ratio nanopatterning at high sensitivity is presented. SML contrast curves were generated for methyl isobutyl ketone (MIBK), MIBK/isopropyl alcohol (IPA)... more
This paper presents an overview of key nanoscale manufacturing technologies, and qualitatively examines their fundamental process requirements with respect to energy demand. The processes requirements are related to semiconductor... more
Developable bottom anti-reflective coatings (DBARC) are an emerging litho material technology. The biggest advantage of DBARC is that it eliminates the plasma etch step, avoiding damage to plasma sensitive layers during implantation. AZ... more
On the basis of media hype alone, you might conclude that biometric passwords will soon replace their alphanumeric counterparts with versions that cannot be stolen, forgotten, lost, or given to another person. But what if the actual... more