Assignment - VLSI
Assignment - VLSI
Assignment - VLSI
Q1.A CMOS process specifies that = 0.071 V1/2and 2|F| =0.58V for an nFET. The
mobilities are given by n =560 cm2/V-secand p =220 cm-2/V-sec
(a) Calculate the thickness of the gate oxide xox and then find Cox
(b) Calculate the process transconductance factors for both nFETs and pFETs.
Q2.Consider a MOS structure that is made with the following characteristics :xox = 200Å,
Na = 1015 cm-3, n-poly gate with Nd= 21019cm-3, Qf = q (1010 ) C/cm-2 >>Qox,
a. Calculate the value Cox and flatband voltage
b. Find the value of the threshold voltage before a threshold adjustment ion
implant.
c. Now find the value of the acceptor implant dose needed to set to 0.7v.
Q3.Consider an nFET process that uses an n-type poly gate. The important processing
parameters are as follows: xox = 100Å, Na = 1015cm-3, n =580 cm-2/V-sec, VTOn = +0.7V.
Q4.Compare the advantages and disadvantages of Dynamic CMOS and static CMOS.
Q5.Explain
a. Constant field & Constant voltage scaling
b. Effect of scaling on threshold voltage for small device
c. Dynamic Logic,
d. Domino Logic,
e. NORA,
f. Zipper Logic.
Q6.Write VHDL code for 4x1 MUX, half adder, full adder and subtractor.
Q7.Derive the expression for dynamic PDP for CMOS inverter and find its value having C out = 300fF
operated with a 5V supply with f=0.5 fmax.
Q9. Draw the stick diagram for NAND gate & NOR gate.