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Electrical Project
Electrical Project
VI Characteristics of a diode
THEORY
Structure of P-N junction diode
The diode is a device formed from a junction of n-type and p-type semiconductor
material. The lead connected to the p-type material is called the anode and the lead
connected to the n-type material is the cathode. In general, the cathode of a diode
is marked by a solid line on the diode.
Figure:1
Figure:2
Figure:3
The strength of the depletion zone electric field increases as the reverse-bias
voltage increases. Once the electric field intensity increases beyond a critical level,
the p–n junction depletion zone breaks down and current begins to flow, usually by
either the Zener or the avalanche breakdown processes. Both of these breakdown
processes are non-destructive and are reversible, as long as the amount of current
flowing does not reach levels that cause the semiconductor material to overheat and
cause thermal damage.
Figure:5
In reverse biasing, the positive terminal of battery is connected to the N side and
the negative terminal of battery is connected to the P side of a diode. In reverse
biasing, the diode does not conduct electricity, since reverse biasing leads to an
increase in the depletion region width; hence current carrier charges find it more
difficult to overcome the barrier potential. The diode will act like an open switch
and there is no current flow.
Figure:6
In reverse biasing, the positive terminal of battery is connected to the N side and
the negative terminal of battery is connected to the P side of a diode. In reverse
biasing, the diode does not conduct electricity, since reverse biasing leads to an
increase in the depletion region width; hence current carrier charges find it more
difficult to overcome the barrier potential. The diode will act like an open switch
and there is no current flow.
Diode Equation
In the forward-biased and reversed-biased regions, the current ( IfIf), and the
voltage (VfVf), of a semiconductor diode are related by the diode equation:
If=Is×(exp^(Vf/n×VT)−1)
where,
VT=(k×T)/q
and
k is Boltzmann’s constant = 1.38x10 J /°Kelvin,
−23
The empirical constant, n, is a number that can vary according to the voltage and
current levels. It depends on electron drift, diffusion, and carrier recombination in
the depletion region. Among the quantities affecting the value of n are the diode
manufacture, levels of doping and purity of materials.
PROCEDURE
1. Forward Bias-Si Diode
1. Set DC voltage to 0.2 V .
2. Select the diode.
3. Set the resistor.
4. Voltmeter is placed parallel to Silicon diode and ammeter series with resistor.
5. The positive side of battery to the P side(anode) and the negative of battery to
the N side(cathode) of the diode.
6. Now vary the voltage upto 5V and note the Voltmeter and Ammeter reading for
particular DC voltage .
7. Take the readings and note Voltmeter reading across Silicon diode and Ammeter
reading.
8. Plot the V-I graph and observe the change.
9. Calculate the dynamic resistance of the diode. rd=ΔV/ΔI
10. Therefore from the graph we see that the diode starts conducting when the
forward bias voltage exceeds around 0.6 volts (for Si diode). This voltage is called
cut-in voltage.
4. Voltmeter is placed parallel to Silicon diode and ammeter series with resistor.
OBSERVATION:
Forward Biased Silicon Diode
Diode Used:1N4004 Vf=0.6
R=140 ohms
S.N. Forward Voltage Forward Current Vdc
1 0 0 0.2
2 0.592 3.56 1.1
3 0.604 7.84 1.7
4 0.616 15 2.7
5 0.622 20 3.4
6 0.626 24.2 4
7 0.63 29.2 4.7
30
urrent(mAmp)
25
20
15
Forward Biased Sillicon DIode
35
30
Forward Current(mAmp) 25
20
15
10
0
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7
Forward Voltage(v)
50
40
30
20
10
0
0 5 10 15 20 25 30 35
Reverse Voltage
30
25
Fprward Current
20
15
10
0
0 0.05 0.1 0.15 0.2 0.25 0.3 0.35
Forward Voltage
30000
25000
ent
Reverse Biased Germanium DIode
35000
30000
25000
Reverse Current
20000
15000
10000
5000
0
0 5 10 15 20 25 30 35
Reverse Voltage
CONCLUSION:
We were able to observe forward and reverse biasing of silicon and germanium d
erve its working in a graphical representation.
EXPERIMENT = 06
BJT Common Emitter Characteristics
THEORY
Structure of Bipolar Junction Transistor
A bipolar junction transistor, BJT, is a single piece of silicon with two back-to-back
P-N junctions.BJTs can be made either as PNP or as NPN.
They have three regions and three terminals, emitter, base, and collector
represented by E, B, and C respectively. The direction of the arrow indicates the
direction of the current in the emitter when the transistor is conducting normally.
An easy way to remember this is NPN stands for "Not Pointing iN".
Base (B):It is the middle region where either two p-type layers or two n-type layers
are sandwiched. The majority carriers from the emitter region are injected into this
rgion.This region is thin and very lightly doped.
Collector (C):It is the region to right end where charge carriers are collected.The
area of this region is largest compared to emitter and base region . The doping
level of this region is intermediate between heavily doped emitter region and lightly
doped base region.
Cut-Off Region
In Cut-Off region both junctions are reverse biased, Base-emitter junction is reverse
biased (VBE<0)and also Collector-Base junction is reverse biased( VCB>0).With
reverse biasing, all currents are zero.There are some leakage currents associated
with reverse biased junctions,but these currents are small and therefore can be
neglected.
Application: Open switch
IC=−αF×IE+ICO
where,
αF is the forward current transfer ratio
ICO is Collector reverse saturation current
Saturation Region
IE=−αR∗IC+IEO
where,
αR is the reverse current transfer ratio\newline IEO is the Emitter reverse saturation
current
This configuration is rarely used because most transistors are doped selectively to
give forward current transfer ratios very near unity, which automatically causes the
reverse current transfer ratio to be very low.
The DC behavior of the BJT can be described by the Ebers-Moll Model. The
equations for the model are:
IF=IES×(exp^(vBE/VT ) −1)
IR=ICS×(exp^(VCB/VT)−1)
where,
IES is base-emitter saturation currents,
ICS is base-collector saturation currents
VT=(k×T)/q
where,
k is the Boltzmann’s constant ( k = 1.381 e-23 V.C/ K ),
T is the absolute temperature in degrees Kelvin, and
q is the charge of an electron (q = 1.602 e-19 C).
βF=αF/(1−αF)
βR=αR/(1−αR)
where,
βF is large signal forward current gain of common-emitter configuration,
αF=βF/(1+βF)
αR=βR/(1+βR)
where,
αR is large signal reverse current gain of a common-base configuration,
αF is large signal forward current gain of the common-base configuration.
IC=αF×IF−IR
IE=−IF+αR∗IR
IB=(1−αF)×IF+(1−αR)×IR
The forward and reverse current gains are related by the expression
αR×ICS=αF×IES=IS
where,
IS is the BJT transport saturation current.
The parameters αRαR and αFαF are influenced by impurity concentrations and
junction depths.
The saturation current, IS , can be expressed as
IS=JS×A
where,
A is the area of the emitter and
JS is the transport saturation current density
Input Characteristics
The most important characteristic of the BJT is the plot of the base current, IBIB,
versus the base-emitter voltage,VBEVBE, for various values of the collector-emitter
voltage,VCE
Output Characteristics
The most important characteristic of the BJT is the plot of the collector current, I , C
versus the collector-emitter voltage,V , for various values of the base current, I as
CE B
IC=ϕ(VCE,IB)for constant IB
Figure 5: Output Characteristics Circuit
PROCEDURE
1. BJT Common Emitter - Input Characteristics
1. Initially set rheostat R = 1 Ω and rheostat R = 1 Ω
h1 h2
35
30
25
Base Current
20
15
10
0
0 0.5 1 1.5 2 2.5
0
0 0.5 1 1.5 2 2.5
60
50
Collector Current
40
30
20
10
0
0 2 4 6 8 10 12
Collector C
30
20
10
0
0 2 4 6 8 10 12
CONCLUSION:
From this experiment, we were able to observe BJT common input and output characteristics
and their graphical representation of their characteristics.
LAB REPORT
SIGNATURE