1.MOSFET Introduction 2.physical Operation 3.layout Introduction
1.MOSFET Introduction 2.physical Operation 3.layout Introduction
MOSFET introduction
2.Physical operation
3.Layout introduction
1.MOSFET introduction
The metal-oxide-semiconductor field- effect transistor (MOSFET) is a type of transistor used for
amplifying or switching electronic signals. And it has four terminals as follow :
S : source
G :gate
D :drain
B : body (well or substrate) or bulk
There are two kind of MOSFET : NMOS and PMOS.
The gate is separated from the n channel by a layer of insulating silicon dioxide (the O
in MOSFET, for oxide). Therefore, it does not make electrical contact with the rest of
the semiconducting material.
The source is so named because it is the source of the charge carriers (electrons for nchannel,
holes for p-channel) that flow through the channel. Similarly, the drain is
where the charge carriers leave the channel
2. Physical operation ( for NMOS)
when 𝑉𝐺𝑆 < 0 mobile holes from the substrate are attracted (or accumulated) under the
gate oxide. Therefore, there is no current. The transistor is OFF.
When 𝑉𝑡ℎ > 𝑉𝐺𝑆 , it is not positive enough to
attract a large number of electrons, the
surface under the gate is said to be nearly
depleted (depleted of free electrons and
holes).
• Moreover, under the 𝑉𝐷𝑆 < 𝑉𝐺𝑆 − 𝑉𝑡ℎ condition the greater the 𝑉𝐷𝑆 is, the higher the 𝐼𝐷
is. This region is called triode region
Saturation point.
More information in
• (29 -9 to 29 -10 ) physics for scientists & engineers
• (5.3 ) CMOS_Circuit_Design_Layout_and_Simulation
3. Layout introduction
Layout of inv
A
GND VDD
Y
p+ n+ n+ p+ p+ n+
n well
p substrate
Layer pp cover
diffusion of p+ VDD
P substrate
Well
I OUT
N
A2
OUT
A1
Floor -plan
SE
IN
SEX OUT